Man-Ling Lu
15Patents
3h-index
14Co-inventors
49Inventor score
Filing activity: Jul 27, 2014 → Aug 6, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9385191B2 | FINFET structure | Electricity | 7 | Active |
| US9780218B1 | Bottom-up epitaxy growth on air-gap buffer | Emerging Cross-Sectional Technologies | 5 | Active |
| US9786510B2 | Fin-shaped structure and manufacturing method thereof | Electricity | 5 | Active |
| US9899523B2 | Semiconductor structure | Electricity | 3 | Active |
| US9691901B2 | Semiconductor device | Electricity | 3 | Active |
| US10050146B2 | Semiconductor device and method of forming the same | Electricity | 2 | Active |
| US9224864B1 | Semiconductor device and method of fabricating the same | Electricity | 2 | Active |
| US10158022B2 | Bottom-up epitaxy growth on air-gap buffer | Emerging Cross-Sectional Technologies | 2 | Active |
| US9373718B2 | Etching method for forming grooves in Si-substrate and fin field-effect transistor | Electricity | 1 | Active |
| US9634125B2 | Fin field effect transistor device and fabrication method thereof | Electricity | 1 | Active |
| US9978854B2 | Fin field-effect transistor | Electricity | 0 | Active |
| US10418251B2 | Method of forming fin-shaped structure having ladder-shaped cross-sectional profile | Electricity | 0 | Active |
| US10529856B2 | Method of forming semiconductor device | Electricity | 0 | Active |
| US10930517B2 | Method of forming fin-shaped structure | Electricity | 0 | Active |
| US9397190B2 | Fabrication method of semiconductor structure | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.