Mitsuo Tada
20Patents
8h-index
37Co-inventors
75Inventor score
Filing activity: May 21, 1979 → Feb 21, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6517689B1 | Plating device | Physics | 37 | Expired |
| US7046001B2 | Frequency measuring device, polishing device using the same and eddy current sensor | Physics | 22 | Expired |
| US7670206B2 | Substrate polishing apparatus and substrate polishing method | Performing Operations; Transporting | 15 | Expired |
| US7508201B2 | Eddy current sensor | Physics | 12 | Expired |
| US7078894B2 | Polishing device using eddy current sensor | Physics | 11 | Expired |
| US6746319B2 | Measuring apparatus | Physics | 11 | Expired |
| US4375917A | Single-chip, MOS-LSI microprocessor controlled electrophotographic copying machine | Physics | 8 | Expired |
| US7714572B2 | Method of detecting characteristics of films using eddy current | Physics | 8 | Active |
| US7854646B2 | Substrate polishing apparatus and substrate polishing method | Performing Operations; Transporting | 7 | Active |
| US6500317B1 | Plating apparatus for detecting the conductivity between plating contacts on a substrate | Physics | 5 | Expired |
| US7258595B2 | Polishing apparatus | Performing Operations; Transporting | 4 | Expired |
| US8696924B2 | Polishing apparatus and polishing method | Performing Operations; Transporting | 3 | Active |
| US7960188B2 | Polishing method | Electricity | 2 | Active |
| US8657644B2 | Eddy current sensor and polishing method and apparatus | Performing Operations; Transporting | 2 | Active |
| US9437507B2 | Method of correcting film thickness measurement value, film thickness corrector and eddy current sensor | Electricity | 2 | Active |
| US9632061B2 | Eddy current sensor and polishing method | Electricity | 2 | Active |
| US6935935B2 | Measuring apparatus | Physics | 1 | Expired |
| US10933507B2 | Polishing apparatus | Electricity | 1 | Active |
| US10739488B2 | Metal detection sensor and metal detection method using same | Physics | 1 | Active |
| US10134614B2 | Substrate peripheral portion measuring device, and substrate peripheral portion polishing apparatus | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.