Paul Fest
19Patents
5h-index
4Co-inventors
51Inventor score
Filing activity: Mar 15, 2013 → Oct 15, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9412942B2 | Resistive memory cell with bottom electrode having a sloped side wall | Electricity | 10 | Active |
| US9362496B2 | Resistive memory cell with trench-shaped bottom electrode | Electricity | 9 | Active |
| US9318702B2 | Resistive memory cell having a reduced conductive path area | Electricity | 9 | Active |
| US9269606B2 | Spacer enabled active isolation for an integrated circuit device | Electricity | 5 | Active |
| US9385313B2 | Resistive memory cell having a reduced conductive path area | Electricity | 5 | Active |
| US9865813B2 | Method for forming resistive memory cell having a spacer region under an electrolyte region and a top electrode | Electricity | 4 | Active |
| US10003021B2 | Resistive memory cell with sloped bottom electrode | Electricity | 4 | Active |
| US9917251B2 | Resistive memory cell having a reduced conductive path area | Electricity | 3 | Active |
| US9865814B2 | Resistive memory cell having a single bottom electrode and two top electrodes | Electricity | 3 | Active |
| US9034758B2 | Forming fence conductors using spacer etched trenches | Electricity | 1 | Active |
| US9385043B2 | Spacer enabled poly gate | Electricity | 1 | Active |
| US10290503B2 | Spacer enabled poly gate | Electricity | 0 | Active |
| US11508500B2 | Thin film resistor (TFR) formed in an integrated circuit device using TFR cap layer(s) as an etch stop and/or hardmask | Electricity | 0 | Active |
| US10763324B2 | Systems and methods for forming a thin film resistor integrated in an integrated circuit device | Electricity | 0 | Active |
| US11990257B2 | Thin film resistor (TFR) formed in an integrated circuit device using wet etching of a dielectric cap | Emerging Cross-Sectional Technologies | 0 | Active |
| US11495657B2 | Thin film resistor (TFR) formed in an integrated circuit device using an oxide cap layer as a TFR etch hardmask | Electricity | 0 | Active |
| US8836128B1 | Forming fence conductors in an integrated circuit | Electricity | 0 | Active |
| US11088024B2 | Forming a thin film resistor (TFR) in an integrated circuit device | Electricity | 0 | Active |
| US9583435B2 | Forming fence conductors using spacer etched trenches | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.