Rajesh Baskaran
13Patents
2h-index
18Co-inventors
47Inventor score
Filing activity: Nov 15, 2002 → Aug 12, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7135404B2 | Method for applying metal features onto barrier layers using electrochemical deposition | Electricity | 8 | Expired |
| US7628898B2 | Method and system for idle state operation | Chemistry; Metallurgy | 3 | Active |
| US8236159B2 | Electrolytic process using cation permeable barrier | Chemistry; Metallurgy | 2 | Active |
| US8123926B2 | Electrolytic copper process using anion permeable barrier | Electricity | 1 | Active |
| US10855230B2 | FET operational temperature determination by field plate resistance thermometry | Electricity | 1 | Active |
| US8928133B2 | Interlocking type solder connections for alignment and bonding of wafers and/or substrates | Electricity | 1 | Active |
| US10147642B1 | Barrier for preventing eutectic break-through in through-substrate vias | Electricity | 1 | Active |
| US8961771B2 | Electrolytic process using cation permeable barrier | Chemistry; Metallurgy | 1 | Active |
| US10790787B2 | FET operational temperature determination by gate structure resistance thermometry | Electricity | 1 | Active |
| US8852417B2 | Electrolytic process using anion permeable barrier | Electricity | 0 | Active |
| US11676860B2 | Barrier for preventing eutectic break-through in through-substrate vias | Electricity | 0 | Active |
| US9234293B2 | Electrolytic copper process using anion permeable barrier | Electricity | 0 | Active |
| US7252714B2 | Apparatus and method for thermally controlled processing of microelectronic workpieces | Emerging Cross-Sectional Technologies | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.