Robert Vacassy
9Patents
5h-index
15Co-inventors
56Inventor score
Filing activity: Sep 7, 1999 → Aug 14, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7582127B2 | Polishing composition for a tungsten-containing substrate | Electricity | 18 | Active |
| US9951054B2 | CMP porous pad with particles in a polymeric matrix | Chemistry; Metallurgy | 14 | Active |
| US7247567B2 | Method of polishing a tungsten-containing substrate | Electricity | 13 | Expired |
| US6458335B1 | Production of powders | Emerging Cross-Sectional Technologies | 11 | Expired |
| US7294576B1 | Tunable selectivity slurries in CMP applications | Electricity | 5 | Active |
| US6682575B2 | Methanol-containing silica-based CMP compositions | Chemistry; Metallurgy | 2 | Expired |
| US9074118B2 | CMP method for metal-containing substrates | Electricity | 1 | Active |
| US7677956B2 | Compositions and methods for dielectric CMP | Electricity | 1 | Expired |
| US9463551B2 | Polishing pad with porous interface and solid core, and related apparatus and methods | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.