Tzung-Chi Lee
18Patents
6h-index
21Co-inventors
62Inventor score
Filing activity: Jun 30, 2006 → Aug 5, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8125051B2 | Device layout for gate last process | Electricity | 15 | Active |
| US10079289B2 | Metal gate structure and methods thereof | Electricity | 10 | Active |
| US9865589B1 | System and method of fabricating ESD FinFET with improved metal landing in the drain | Electricity | 7 | Active |
| US8368136B2 | Integrating a capacitor in a metal gate last process | Electricity | 7 | Active |
| US8237227B2 | Dummy gate structure for gate last process | Electricity | 7 | Active |
| US10141296B2 | Dummy fin cell placement in an integrated circuit layout | Electricity | 6 | Active |
| US8530326B2 | Method of fabricating a dummy gate structure in a gate last process | Electricity | 5 | Active |
| US10204202B2 | Dummy fin cell placement in an integrated circuit layout | Electricity | 4 | Active |
| US10276559B2 | System and method of fabricating ESD FinFET with improved metal landing in the drain | Electricity | 3 | Active |
| US10535746B2 | Metal gate structure and methods thereof | Electricity | 2 | Active |
| US11004842B2 | System and method of fabricating ESD FinFET with improved metal landing in the drain | Electricity | 0 | Active |
| US7550795B2 | SOI devices and methods for fabricating the same | Electricity | 0 | Active |
| US10453837B2 | System and method of fabricating ESD finFET with improved metal landing in the drain | Electricity | 0 | Active |
| US11881477B2 | Dummy poly layout for high density devices | Electricity | 0 | Active |
| US12199087B2 | Dummy poly layout for high density devices | Electricity | 0 | Active |
| US11043572B2 | Metal gate structure and methods thereof | Electricity | 0 | Active |
| US7803674B2 | Methods for fabricating SOI devices | Electricity | 0 | Active |
| US7812379B2 | SOI devices | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.