Dielectric covered electrostatic chuck
US6414834B1 · kind B1 · utility
29Cited by
34References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 16, 2000 |
| Grant date | Jul 2, 2002 |
| Priority date | — |
| Expiry date | Jun 16, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T279/23
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An electrostatic chuck 100 useful for holding a substrate 55 in a high density plasma, comprises an electrode 110 at least partially covered by a semiconducting dielectric 115, wherein the semiconducting dielectric 115 may have an electrical resistance of from about 5×109 &OHgr;cm to about 8×1010 &OHgr;cm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.