Timothy Dyer
35Patents
14h-index
63Co-inventors
84Inventor score
Filing activity: Apr 26, 1996 → Oct 6, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6465051B1 | Method of operating high density plasma CVD reactor with combined inductive and capacitive coupling | Electricity | 191 | Expired |
| US6108189A | Electrostatic chuck having improved gas conduits | Emerging Cross-Sectional Technologies | 138 | Expired |
| US6972421B2 | Extreme ultraviolet light source | Electricity | 86 | Expired |
| US5720818A | Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck | Emerging Cross-Sectional Technologies | 81 | Expired |
| US6721162B2 | Electrostatic chuck having composite dielectric layer and method of manufacture | Emerging Cross-Sectional Technologies | 51 | Expired |
| US7368741B2 | Extreme ultraviolet light source | Electricity | 45 | Expired |
| US6447368B1 | Carriers with concentric balloons supporting a diaphragm | Performing Operations; Transporting | 37 | Expired |
| US6414834B1 | Dielectric covered electrostatic chuck | Emerging Cross-Sectional Technologies | 29 | Expired |
| US5904776A | Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck | Emerging Cross-Sectional Technologies | 25 | Expired |
| US6288357A | Ion milling planarization of semiconductor workpieces | Electricity | 24 | Expired |
| US6409580B1 | Rigid polishing pad conditioner for chemical mechanical polishing tool | Performing Operations; Transporting | 23 | Expired |
| US7193228B2 | EUV light source optical elements | Physics | 22 | Expired |
| US6793565B1 | Orbiting indexable belt polishing station for chemical mechanical polishing | Performing Operations; Transporting | 18 | Expired |
| US7366219B2 | Line narrowing module | Electricity | 16 | Expired |
| US6540592B1 | Carrier head with reduced moment wear ring | Performing Operations; Transporting | 13 | Expired |
| US5744400A | Apparatus and method for dry milling of non-planar features on a semiconductor surface | Electricity | 11 | Expired |
| US8742604B2 | Systems and methods for combined flow control and electricity generation | Mechanical Engineering; Lighting; Heating | 9 | Active |
| US6652366B2 | Dynamic slurry distribution control for CMP | Performing Operations; Transporting | 8 | Expired |
| US6690706B2 | High rep-rate laser with improved electrodes | Electricity | 8 | Expired |
| US8893702B2 | Ductile mode machining methods for hard and brittle components of plasma processing apparatuses | Emerging Cross-Sectional Technologies | 5 | Active |
| US6209483A | Apparatus and method for removing silicon dioxide residues from CVD reactors | Chemistry; Metallurgy | 5 | Expired |
| US7522650B2 | Gas discharge laser chamber improvements | Electricity | 4 | Expired |
| US5800623A | Semiconductor wafer support platform | Chemistry; Metallurgy | 3 | Expired |
| US6661826B2 | Laser chamber insulator with sealed electrode feedthrough | Electricity | 3 | Expired |
| US6203417A | Chemical mechanical polishing tool components with improved corrosion resistance | Performing Operations; Transporting | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.