Methods to improve the in-film defectivity of PECVD amorphous carbon films

US7514125B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Deenesh Padhi · Sunnyvale, US
• Chiu Chan · Foster City, US
• Sudha Rathi · San Jose, US
• Ganesh Balasubramanian · Sunnyvale, US
• Jianhua Zhou · Campbell, US
• Karthik Janakiraman · San Jose, US
• Martin Jay Seamons · San Jose, US
• Visweswaren Sivaramakrishnan · Cupertino, US
• Derek R. Witty · Fremont, US
• Hichem M'Saad · Santa Clara, US

Key dates

• Filing date: Feb 28, 2007
• Grant date: Apr 7, 2009
• Expiry date: Feb 28, 2027

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/4404
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Methods of making an article having a protective coating for use in semiconductor applications are provided. In certain embodiments, a method of coating an aluminum surface of an article utilized in a semiconductor processing chamber is provided. The method comprises providing a processing chamber; placing the article into the processing chamber; flowing a first gas comprising a carbon source into the processing chamber; flowing a second gas comprising a nitrogen source into the processing chamber; forming a plasma in the chamber; and depositing a coating material on the aluminum surface. In certain embodiments, the coating material comprises an amorphous carbon nitrogen containing layer. In certain embodiments, the article comprises a showerhead configured to deliver a gas to the processing chamber.