ProMOS Technology, Inc.
17Patents
0Active
17Granted
33Portfolio score
Filing activity: Aug 3, 1998 → Aug 17, 2004
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6306772A | Deep trench bottle-shaped etching using Cl2 gas | Electricity | 172 | Expired |
| US6440792B1 | DRAM technology of storage node formation and no conduction/isolation process of bottle-shaped deep trench | Electricity | 45 | Expired |
| US6232171A | Technique of bottle-shaped deep trench formation | Electricity | 35 | Expired |
| US6495411B1 | Technique to improve deep trench capacitance by increasing surface thereof | Emerging Cross-Sectional Technologies | 29 | Expired |
| US6365485B1 | DRAM technology of buried plate formation of bottle-shaped deep trench | Electricity | 29 | Expired |
| US6071823A | Deep trench bottle-shaped etch in centura mark II NG | Electricity | 21 | Expired |
| US6291286A | Two-step strap implantation of making deep trench capacitors for DRAM cells | Electricity | 20 | Expired |
| US6083787A | Method of fabricating deep trench capacitors for dram cells | Electricity | 9 | Expired |
| US6146260A | Polishing machine | Performing Operations; Transporting | 8 | Expired |
| US6214713A | Two step cap nitride deposition for forming gate electrodes | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6211055A | Wet-dry-wet process in wet station | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7087998B2 | Control of air gap position in a dielectric layer | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6146987A | Method for forming a contact plug over an underlying metal line using an etching stop layer | Electricity | 6 | Expired |
| US6179915A | On track coater unit cup set | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6187650A | Method for improving global planarization uniformity of a silicon nitride layer used in the formation of trenches by using a sandwich stop layer | Electricity | 2 | Expired |
| US6242137A | Method to uni-directionally expand bandwidth of an asymmetric optical system | Physics | 1 | Expired |
| US6194232A | Multi-track wafer processing method | Emerging Cross-Sectional Technologies | 1 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.