Reflectivity, Inc.
94Patents
0Active
94Granted
40Portfolio score
Filing activity: Jun 18, 1996 → Aug 30, 2005
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5835256A | Reflective spatial light modulator with encapsulated micro-mechanical elements | Physics | 385 | Expired |
| US6046840A | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements | Emerging Cross-Sectional Technologies | 379 | Expired |
| US6356378B1 | Double substrate reflective spatial light modulator | Emerging Cross-Sectional Technologies | 278 | Expired |
| US6172797A | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements | Emerging Cross-Sectional Technologies | 206 | Expired |
| US6844959B2 | Spatial light modulators with light absorbing areas | Emerging Cross-Sectional Technologies | 179 | Expired |
| US6947200B2 | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements | Emerging Cross-Sectional Technologies | 176 | Expired |
| US6388661B1 | Monochrome and color digital display systems and methods | Physics | 136 | Expired |
| US6337760B1 | Encapsulated multi-directional light beam steering device | Physics | 126 | Expired |
| US6523961B2 | Projection system and mirror elements for improved contrast ratio in spatial light modulators | Performing Operations; Transporting | 108 | Expired |
| US7009754B2 | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements | Emerging Cross-Sectional Technologies | 107 | Expired |
| US7002726B2 | Micromirror having reduced space between hinge and mirror plate of the micromirror | Physics | 104 | Expired |
| US6969635B2 | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates | Electricity | 100 | Expired |
| US6906847B2 | Spatial light modulators with light blocking/absorbing areas | Electricity | 96 | Expired |
| US6960305B2 | Methods for forming and releasing microelectromechanical structures | Electricity | 96 | Expired |
| US6849471B2 | Barrier layers for microelectromechanical systems | Performing Operations; Transporting | 93 | Expired |
| US6913942B2 | Sacrificial layers for use in fabrications of microelectromechanical devices | Performing Operations; Transporting | 90 | Expired |
| US6290864A | Fluoride gas etching of silicon with improved selectivity | Electricity | 90 | Expired |
| US7042623B1 | Light blocking layers in MEMS packages | Physics | 84 | Expired |
| US6396619B1 | Deflectable spatial light modulator having stopping mechanisms | Physics | 78 | Expired |
| US6974713B2 | Micromirrors with mechanisms for enhancing coupling of the micromirrors with electrostatic fields | Physics | 78 | Expired |
| US6529310B1 | Deflectable spatial light modulator having superimposed hinge and deflectable element | Physics | 73 | Expired |
| US6900072B2 | Method for making a micromechanical device by using a sacrificial substrate | Electricity | 71 | Expired |
| US6962419B2 | Micromirror elements, package for the micromirror elements, and projection system therefor | Electricity | 58 | Expired |
| US6741383B2 | Deflectable micromirrors with stopping mechanisms | Physics | 55 | Expired |
| US7041224B2 | Method for vapor phase etching of silicon | Performing Operations; Transporting | 50 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.