Inventor · Cromwell, CT, US

Han Wang

14Patents

9h-index

29Co-inventors

64Inventor score

Filing activity: Aug 5, 2015 → Aug 1, 2023

Most-cited inventions

Patent	Title	Area	Cited by	Status
US9803277B1	Reaction chamber passivation and selective deposition of metallic films	Electricity	74	Active
US10041166B2	Reaction chamber passivation and selective deposition of metallic films	Electricity	51	Active
US10480064B2	Reaction chamber passivation and selective deposition of metallic films	Electricity	43	Active
US10121699B2	Selective deposition of aluminum and nitrogen containing material	Electricity	20	Active
US10566185B2	Selective deposition of aluminum and nitrogen containing material	Electricity	19	Active
US10553482B2	Selective deposition of aluminum and nitrogen containing material	Electricity	17	Active
US10847361B2	Selective deposition of aluminum and nitrogen containing material	Electricity	15	Active
US10903113B2	Selective deposition of aluminum and nitrogen containing material	Electricity	15	Active
US10793946B1	Reaction chamber passivation and selective deposition of metallic films	Electricity	15	Active
US11761081B2	Methods for depositing tungsten or molybdenum films	Electricity	1	Active
US11380539B2	Selective deposition of silicon nitride	Electricity	0	Active
US12252787B2	Methods for depositing tungsten or molybdenum films	Electricity	0	Active
US11965239B2	Method for nucleation of conductive nitride films	Electricity	0	Active
US11964881B2	Method for making iridium oxide nanoparticles	Chemistry; Metallurgy	0	Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.