Ian Robert Harvey
28Patents
10h-index
26Co-inventors
75Inventor score
Filing activity: Feb 13, 1996 → Sep 7, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6249039A | Integrated inductive components and method of fabricating such components | Electricity | 165 | Expired |
| US6236222A | Method and apparatus for detecting misalignments in interconnect structures | Physics | 98 | Expired |
| US6174803A | Integrated circuit device interconnection techniques | Electricity | 60 | Expired |
| US6241587A | System for dislodging by-product agglomerations from a polishing pad of a chemical mechanical polishing machine | Performing Operations; Transporting | 39 | Expired |
| US6207543A | Metallization technique for gate electrodes and local interconnects | Electricity | 33 | Expired |
| US6008130A | Polymer adhesive plasma confinement ring | Emerging Cross-Sectional Technologies | 31 | Expired |
| US6057227A | Oxide etch stop techniques for uniform damascene trench depth | Electricity | 26 | Expired |
| US5880006A | Method for fabrication of a semiconductor device | Electricity | 18 | Expired |
| US6013558A | Silicon-enriched shallow trench oxide for reduced recess during LDD spacer etch | Electricity | 10 | Expired |
| US5793095A | Custom laser conductor linkage for integrated circuits | Electricity | 10 | Expired |
| US5895245A | Plasma ash for silicon surface preparation | Emerging Cross-Sectional Technologies | 8 | Expired |
| US5923960A | Method of making a custom laser conductor linkage for the integrated circuits | Electricity | 8 | Expired |
| US6309948A | Method for fabrication of a semiconductor device | Electricity | 8 | Expired |
| US6215129A | Via alignment, etch completion, and critical dimension measurement method and structure | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6060376A | Integrated etch process for polysilicon/metal gate | Electricity | 6 | Expired |
| US6197621A | Custom laser conductor linkage for integrated circuits | Electricity | 5 | Expired |
| US5821163A | Method for achieving accurate SOG etchback selectivity | Electricity | 5 | Expired |
| US6027950A | Method for achieving accurate SOG etchback selectivity | Electricity | 5 | Expired |
| US6084305A | Shaped etch-front for self-aligned contact | Electricity | 4 | Expired |
| USD569051S1 | RFID animal ear tag | General | 2 | Expired |
| US6080677A | Method for preventing micromasking in shallow trench isolation process etching | Electricity | 2 | Expired |
| US5976987A | In-situ corner rounding during oxide etch for improved plug fill | Electricity | 1 | Expired |
| US6162650A | Via alignment, etch completion, and critical dimension measurement method and structure | Emerging Cross-Sectional Technologies | 1 | Expired |
| US8421305B2 | MEMS devices and systems actuated by an energy field | Electricity | 1 | Active |
| US11109571B2 | Social group management system and method therefor | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.