Jia-Ming Lin
14Patents
2h-index
18Co-inventors
43Inventor score
Filing activity: Jun 29, 2015 → Jun 13, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9691766B1 | Fin field effect transistor and method for fabricating the same | Electricity | 11 | Active |
| US10658252B2 | Semiconductor structure and method for forming the same | Electricity | 2 | Active |
| US11610982B2 | Void elimination for gap-filling in high-aspect ratio trenches | Electricity | 1 | Active |
| US11967504B2 | Gate structures in transistor devices and methods of forming same | Electricity | 1 | Active |
| US11715762B2 | Transistor gate structures and methods of forming the same | Electricity | 1 | Active |
| US10269664B2 | Semiconductor structure and method for forming the same | Electricity | 1 | Active |
| US9991154B2 | Method for fabricating a fin field effect transistor and a shallow trench isolation | Electricity | 0 | Active |
| US10854713B2 | Method for forming trench structure of semiconductor device | Electricity | 0 | Active |
| US12100751B2 | Void elimination for gap-filling in high-aspect ratio trenches | Electricity | 0 | Active |
| US9824943B2 | Semiconductor structure and method for forming the same | Electricity | 0 | Active |
| US9871100B2 | Trench structure of semiconductor device having uneven nitrogen distribution liner | Electricity | 0 | Active |
| US10957545B2 | Method for manufacturing semiconductor device | Electricity | 0 | Active |
| US10861701B2 | Semiconductor device and manufacturing method thereof | Electricity | 0 | Active |
| US12218199B2 | Transistor gate structures and methods of forming the same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.