Kazuki Denpoh
20Patents
7h-index
23Co-inventors
69Inventor score
Filing activity: Apr 4, 1995 → Mar 24, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9941097B2 | Plasma processing apparatus | Electricity | 104 | Active |
| US5718763A | Resist processing apparatus for a rectangular substrate | Emerging Cross-Sectional Technologies | 76 | Expired |
| US9313872B2 | Plasma processing apparatus and plasma processing method | Electricity | 43 | Active |
| US7847247B2 | Method of plasma particle simulation, storage medium, plasma particle simulator and plasma processing apparatus | Electricity | 29 | Active |
| US7713431B2 | Plasma processing method | Electricity | 13 | Expired |
| US6514347B2 | Apparatus and method for plasma treatment | Electricity | 9 | Expired |
| US6828243B2 | Apparatus and method for plasma treatment | Electricity | 8 | Expired |
| US8409459B2 | Hollow cathode device and method for using the device to control the uniformity of a plasma process | Chemistry; Metallurgy | 7 | Active |
| US9997332B2 | Plasma processing apparatus and plasma processing method | Electricity | 7 | Active |
| US8124539B2 | Plasma processing apparatus, focus ring, and susceptor | Electricity | 7 | Active |
| US9253867B2 | Plasma processing apparatus and plasma processing method | Electricity | 7 | Active |
| US5853803A | Resist processing method and apparatus | Emerging Cross-Sectional Technologies | 7 | Expired |
| US8608903B2 | Plasma processing apparatus and plasma processing method | Electricity | 6 | Active |
| US8741097B2 | Plasma processing apparatus and plasma processing method | Electricity | 5 | Active |
| US7691226B2 | Electron temperature measurement method, electron temperature measurement program for implementing the method, and storage medium storing the electron temperature measurement program | Electricity | 5 | Active |
| US10804076B2 | Plasma processing apparatus and plasma processing method | Electricity | 2 | Active |
| US9136097B2 | Shower plate and substrate processing apparatus | Electricity | 1 | Active |
| US9899191B2 | Plasma processing apparatus | Electricity | 1 | Active |
| US9455133B2 | Hollow cathode device and method for using the device to control the uniformity of a plasma process | Chemistry; Metallurgy | 0 | Active |
| US8829387B2 | Plasma processing apparatus having hollow electrode on periphery and plasma control method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.