Masahiro Tabata
48Patents
3h-index
23Co-inventors
63Inventor score
Filing activity: Sep 17, 1997 → Jun 2, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7722257B2 | Roller bearing cage and tapered roller bearing | Mechanical Engineering; Lighting; Heating | 14 | Active |
| US5903526A | Magneto-optical recording medium having multiple magnetic layers | Physics | 4 | Expired |
| US10381236B2 | Method of processing target object | Electricity | 4 | Active |
| US10319613B2 | Method of selectively etching first region made of silicon nitride against second region made of silicon oxide | Electricity | 3 | Active |
| US8063002B2 | Rolling device and rolling device manufacturing method | Mechanical Engineering; Lighting; Heating | 2 | Active |
| US11289339B2 | Plasma processing method and plasma processing apparatus | Electricity | 1 | Active |
| US8202006B2 | Sealing device, rolling bearing, and rolling bearing for wheel | Mechanical Engineering; Lighting; Heating | 1 | Active |
| US10553446B2 | Method of processing target object | Electricity | 1 | Active |
| US10755944B2 | Etching method and plasma processing apparatus | Electricity | 1 | Active |
| US11133192B2 | Workpiece processing method | Electricity | 1 | Active |
| US10600660B2 | Method of selectively etching first region made of silicon nitride against second region made of silicon oxide | Electricity | 1 | Active |
| US7126884B2 | Magneto-optical recording medium having multiple magnetic layers | Physics | 1 | Expired |
| US7926817B2 | Sealing apparatus and bearing apparatus having the same | Mechanical Engineering; Lighting; Heating | 1 | Active |
| US11574814B2 | Substrate and substrate processing method | Emerging Cross-Sectional Technologies | 0 | Active |
| US11637025B2 | Apparatus for selectively etching first region made of silicon nitride against second region made of silicon oxide | Electricity | 0 | Active |
| US11594422B2 | Film etching method for etching film | Electricity | 0 | Active |
| US10777425B2 | Method of processing substrate | Electricity | 0 | Active |
| US11139175B2 | Method of processing target object | Electricity | 0 | Active |
| US10269578B2 | Etching method | Electricity | 0 | Active |
| US10672605B2 | Film forming method | Electricity | 0 | Active |
| US8557904B2 | Sealing device | Mechanical Engineering; Lighting; Heating | 0 | Active |
| US10504741B2 | Semiconductor manufacturing method and plasma processing apparatus | Electricity | 0 | Active |
| US11145518B2 | Method and apparatus for etching target object | Electricity | 0 | Active |
| US10916420B2 | Processing method and plasma processing apparatus | Electricity | 0 | Active |
| US12308241B2 | Plasma processing method and plasma processing apparatus | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.