Masamichi Sakaguchi
12Patents
4h-index
26Co-inventors
56Inventor score
Filing activity: Mar 7, 2001 → Feb 1, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6919274B2 | LSI device etching method and apparatus thereof | Electricity | 9 | Expired |
| US6620737B2 | Plasma etching method | Electricity | 7 | Expired |
| US6617255B2 | Plasma processing method for working the surface of semiconductor devices | Electricity | 4 | Expired |
| US6709984B2 | Method for manufacturing semiconductor device | Electricity | 4 | Expired |
| US7913646B2 | Vacuum processing apparatus and vacuum processing method | Electricity | 1 | Active |
| US8216420B2 | Plasma processing apparatus | Electricity | 1 | Active |
| US7909933B2 | Plasma processing method | Electricity | 1 | Active |
| US7098138B2 | Plasma processing method for working the surface of semiconductor devices | Electricity | 1 | Expired |
| US8486291B2 | Plasma processing method | Electricity | 0 | Active |
| US8143175B2 | Dry etching method | Electricity | 0 | Active |
| US8277563B2 | Plasma processing method | Electricity | 0 | Active |
| US8262801B2 | Vacuum processing method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.