Masato Doura
15Patents
4h-index
14Co-inventors
49Inventor score
Filing activity: Feb 27, 2006 → Jun 14, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8167690B2 | Polishing pad | Performing Operations; Transporting | 12 | Active |
| US9018273B2 | Polishing pad and production method therefor, and production method for semiconductor device | Chemistry; Metallurgy | 7 | Active |
| US8314029B2 | Process for producing polyurethane foam | Chemistry; Metallurgy | 6 | Active |
| US8257153B2 | Polishing pad and a method for manufacturing the same | Performing Operations; Transporting | 5 | Active |
| US8148441B2 | Polishing pad and manufacturing method thereof | Chemistry; Metallurgy | 4 | Active |
| US8409308B2 | Process for manufacturing polishing pad | Emerging Cross-Sectional Technologies | 3 | Active |
| US8094456B2 | Polishing pad | Emerging Cross-Sectional Technologies | 3 | Active |
| US9126303B2 | Method for production of a laminate polishing pad | Chemistry; Metallurgy | 2 | Active |
| US9181386B2 | Polishing pad, manufacturing method therefor, and method for manufacturing a semiconductor device | Chemistry; Metallurgy | 2 | Active |
| US9079289B2 | Polishing pad | Chemistry; Metallurgy | 2 | Active |
| US8398794B2 | Method for manufacturing polishing pad | Emerging Cross-Sectional Technologies | 1 | Active |
| US8500932B2 | Method for manufacturing polishing pad | Emerging Cross-Sectional Technologies | 0 | Active |
| US8348724B2 | Polishing pad manufacturing method | Performing Operations; Transporting | 0 | Active |
| US9050707B2 | Method for manufacturing polishing pad | Emerging Cross-Sectional Technologies | 0 | Active |
| US8602846B2 | Polishing pad and a method for manufacturing the same | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.