Naoki Tamaoki
11Patents
5h-index
22Co-inventors
66Inventor score
Filing activity: Mar 10, 1995 → Sep 1, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7192626B2 | Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition | Electricity | 75 | Expired |
| US8821684B2 | Substrate plasma processing apparatus and plasma processing method | Electricity | 41 | Active |
| US6022806A | Method of forming a film in recess by vapor phase growth | Electricity | 26 | Expired |
| US6365231B2 | Ammonium halide eliminator, chemical vapor deposition system and chemical vapor deposition process | Chemistry; Metallurgy | 11 | Expired |
| US5926402A | Simulation method with respect to trace object that event occurs in proportion to probability and computer program product for causing computer system to perform the simulation | Emerging Cross-Sectional Technologies | 5 | Expired |
| US8209155B2 | Simulation method and simulation program | Physics | 2 | Active |
| US8252193B2 | Plasma processing apparatus of substrate and plasma processing method thereof | Electricity | 1 | Active |
| US8548787B2 | Simulating a chemical reaction phenomenon in a semiconductor process | Physics | 1 | Active |
| US10460050B2 | Topography simulation apparatus, topography simulation method, and topography simulation program | Physics | 0 | Active |
| US7942974B2 | Method of cleaning a film-forming apparatus | Chemistry; Metallurgy | 0 | Active |
| US9996639B2 | Topography simulation apparatus, topography simulation method and recording medium | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.