Robert C. Cook
19Patents
14h-index
7Co-inventors
71Inventor score
Filing activity: Feb 13, 1978 → Sep 9, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6321680A | Vertical plasma enhanced process apparatus and method | Electricity | 467 | Expired |
| US5551985A | Method and apparatus for cold wall chemical vapor deposition | Chemistry; Metallurgy | 80 | Expired |
| US5668533A | High security balanced-type, magnetically-actuated proximity switch system | Electricity | 51 | Expired |
| US6352594B2 | Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors | Electricity | 44 | Expired |
| US4149302A | Monolithic semiconductor integrated circuit ferroelectric memory device | Emerging Cross-Sectional Technologies | 43 | Expired |
| US6352593B1 | Mini-batch process chamber | Electricity | 43 | Expired |
| US4682801A | Electromagnet access control circuit | Emerging Cross-Sectional Technologies | 36 | Expired |
| US4149301A | Monolithic semiconductor integrated circuit-ferroelectric memory drive | Emerging Cross-Sectional Technologies | 30 | Expired |
| US4871204A | Touch bar release locking system | Emerging Cross-Sectional Technologies | 28 | Expired |
| US4516114A | Magnetic locking status detection system | Physics | 18 | Expired |
| USRE36957E | Method and apparatus for cold wall chemical vapor deposition | General | 17 | Expired |
| US6287635A | High rate silicon deposition method at low pressures | Electricity | 17 | Expired |
| US4262591A | Office label printer and dispenser | Performing Operations; Transporting | 15 | Expired |
| US6167837A | Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactor | Electricity | 14 | Expired |
| US6506691B2 | High rate silicon nitride deposition method at low pressures | Electricity | 11 | Expired |
| US7748542B2 | Batch deposition tool and compressed boat | Electricity | 8 | Active |
| US6780464B2 | Thermal gradient enhanced CVD deposition at low pressure | Electricity | 4 | Expired |
| US6235652A | High rate silicon dioxide deposition at low pressures | Electricity | 2 | Expired |
| US7381926B2 | Removable heater | Mechanical Engineering; Lighting; Heating | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.