Ryu Hirota
37Patents
10h-index
23Co-inventors
75Inventor score
Filing activity: Aug 11, 1997 → Sep 16, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7303630B2 | Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate | Chemistry; Metallurgy | 280 | Active |
| US7655960B2 | A1xInyGa1-x-yN mixture crystal substrate, method of growing same and method of producing same | Electricity | 64 | Active |
| US7105865B2 | AlxInyGa1−x−yN mixture crystal substrate | Electricity | 37 | Expired |
| US6667184B2 | Single crystal GaN substrate, method of growing same and method of producing same | Electricity | 36 | Expired |
| US7772585B2 | Nitride semiconductor substrate and method of producing same | Electricity | 18 | Active |
| US7473315B2 | AlxInyGa1-x-yN mixture crystal substrate, method of growing AlxInyGa1-x-yN mixture crystal substrate and method of producing AlxInyGa1-x-yN mixture crystal substrate | Chemistry; Metallurgy | 16 | Active |
| US6475277B1 | Group III-V nitride semiconductor growth method and vapor phase growth apparatus | Emerging Cross-Sectional Technologies | 16 | Expired |
| US7112826B2 | Single crystal GaN substrate semiconductor device | Electricity | 15 | Expired |
| US7589000B2 | Fabrication method and fabrication apparatus of group III nitride crystal substance | Chemistry; Metallurgy | 12 | Active |
| US7771532B2 | Nitride semiconductor substrate and method of producing same | Electricity | 12 | Active |
| US7905958B2 | Group III-nitride semiconductor crystal and manufacturing method thereof, and group III-nitride semiconductor device | Electricity | 8 | Active |
| US7087114B2 | Single crystal GaN substrate, method of growing single crystal GaN and method of producing single crystal GaN substrate | Chemistry; Metallurgy | 7 | Expired |
| US7998847B2 | III-nitride crystal manufacturing method, III-nitride crystal substrate, and III-nitride semiconductor device | Electricity | 7 | Active |
| US5933751A | Method for the heat treatment of II-VI semiconductors | Emerging Cross-Sectional Technologies | 7 | Expired |
| US7297625B2 | Group III-V crystal and manufacturing method thereof | Emerging Cross-Sectional Technologies | 6 | Expired |
| US8002892B2 | Group III nitride crystal substrate, method of its manufacture, and group III nitride semiconductor device | Electricity | 5 | Expired |
| US7129525B2 | Semiconductor light-emitting device | Electricity | 5 | Expired |
| US8310030B2 | III-nitride crystal substrate and III-nitride semiconductor device | Electricity | 3 | Active |
| US7354477B2 | Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate | Chemistry; Metallurgy | 3 | Active |
| US7858502B2 | Fabrication method and fabrication apparatus of group III nitride crystal substance | Chemistry; Metallurgy | 2 | Active |
| US7485484B2 | Group III-V crystal | Emerging Cross-Sectional Technologies | 2 | Active |
| US7794543B2 | Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate | Chemistry; Metallurgy | 2 | Active |
| US8134223B2 | III-V compound crystal and semiconductor electronic circuit element | Electricity | 2 | Active |
| US7288151B2 | Method of manufacturing group-III nitride crystal | Chemistry; Metallurgy | 1 | Expired |
| US8404569B2 | Fabrication method and fabrication apparatus of group III nitride crystal substance | Chemistry; Metallurgy | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.