Sam Sivakumar
14Patents
9h-index
21Co-inventors
72Inventor score
Filing activity: Dec 31, 1997 → Mar 15, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6365529B1 | Method for patterning dual damascene interconnects using a sacrificial light absorbing material | Physics | 60 | Expired |
| US6329118A | Method for patterning dual damascene interconnects using a sacrificial light absorbing material | Physics | 57 | Expired |
| US6406995B1 | Pattern-sensitive deposition for damascene processing | Electricity | 43 | Expired |
| US6037255A | Method for making integrated circuit having polymer interlayer dielectric | Electricity | 34 | Expired |
| US6350670B1 | Method for making a semiconductor device having a carbon doped oxide insulating layer | Electricity | 24 | Expired |
| US6649515B2 | Photoimageable material patterning techniques useful in fabricating conductive lines in circuit structures | Electricity | 23 | Expired |
| US6020266A | Single step electroplating process for interconnect via fill and metal line patterning | Electricity | 21 | Expired |
| US6384481B1 | Single step electroplating process for interconnect via fill and metal line patterning | Electricity | 16 | Expired |
| US6774037B2 | Method integrating polymeric interlayer dielectric in integrated circuits | Electricity | 9 | Expired |
| US7648803B2 | Diagonal corner-to-corner sub-resolution assist features for photolithography | Physics | 8 | Active |
| US7056645B2 | Use of chromeless phase shift features to pattern large area line/space geometries | Physics | 5 | Expired |
| US7374865B2 | Methods to pattern contacts using chromeless phase shift masks | Physics | 5 | Expired |
| US7179570B2 | Chromeless phase shift lithography (CPL) masks having features to pattern large area line/space geometries | Physics | 2 | Expired |
| US11569231B2 | Non-planar transistors with channel regions having varying widths | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.