Tetsuhiro Iwai
23Patents
5h-index
16Co-inventors
66Inventor score
Filing activity: Jun 7, 2000 → Sep 4, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6784112B2 | Method for surface treatment of silicon based substrate | Electricity | 57 | Expired |
| US7994026B2 | Plasma dicing apparatus and method of manufacturing semiconductor chips | Electricity | 19 | Active |
| US7708860B2 | Plasma processing apparatus | Electricity | 10 | Expired |
| US6921720B2 | Plasma treating apparatus and plasma treating method | Electricity | 6 | Expired |
| US7056831B2 | Plasma processing apparatus and plasma processing method | Electricity | 6 | Expired |
| US6340639B1 | Plasma process apparatus and plasma process method for substrate | Electricity | 5 | Expired |
| US8513097B2 | Plasma processing apparatus | Electricity | 5 | Active |
| US6511895B2 | Semiconductor wafer turning process | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6867146B2 | Plasma processing method | Electricity | 4 | Expired |
| US8945411B2 | Plasma processing apparatus and plasma processing method | Electricity | 3 | Active |
| US9401286B2 | Plasma processing apparatus | Electricity | 3 | Active |
| US9583355B2 | Plasma processing apparatus and plasma processing method | Electricity | 2 | Active |
| US7138034B2 | Electrode member used in a plasma treating apparatus | Electricity | 2 | Expired |
| US7074720B2 | Plasma treating apparatus, plasma treating method and method of manufacturing semiconductor device | Electricity | 1 | Expired |
| US10796932B2 | Plasma processing apparatus | Electricity | 1 | Active |
| US6723651B2 | Plasma processing method | Electricity | 1 | Expired |
| US9842750B2 | Plasma processing method | Electricity | 1 | Active |
| US6468351B1 | Vacuum processing apparatus with improved maintainability | Electricity | 1 | Expired |
| US10734203B2 | Plasma processing apparatus and plasma processing method | Electricity | 0 | Active |
| US10672593B2 | Plasma processing apparatus and plasma processing method | Electricity | 0 | Active |
| US9786472B2 | Plasma processing apparatus and method for manufacturing electronic component | Electricity | 0 | Active |
| US11551943B2 | Plasma processing apparatus | Electricity | 0 | Active |
| US6551444B2 | Plasma processing apparatus and method of processing | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.