Vidyut Gopal
39Patents
8h-index
35Co-inventors
71Inventor score
Filing activity: May 7, 2001 → Jul 22, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7067439B2 | ALD metal oxide deposition process using direct oxidation | Electricity | 34 | Expired |
| US6666979B2 | Dry etch release of MEMS structures | Performing Operations; Transporting | 26 | Expired |
| US8569104B2 | Transition metal oxide bilayers | Electricity | 25 | Active |
| US7569501B2 | ALD metal oxide deposition process using direct oxidation | Electricity | 17 | Active |
| US8288297B1 | Atomic layer deposition of metal oxide materials for memory applications | Electricity | 13 | Active |
| US6887732B2 | Microstructure devices, methods of forming a microstructure device and a method of forming a MEMS device | Performing Operations; Transporting | 12 | Expired |
| US8658511B1 | Etching resistive switching and electrode layers | Electricity | 12 | Active |
| US8883557B1 | Controlling composition of multiple oxides in resistive switching layers using atomic layer deposition | Electricity | 8 | Active |
| US8481357B2 | Thin film solar cell with ceramic handling layer | Emerging Cross-Sectional Technologies | 6 | Active |
| US9129894B2 | Embedded nonvolatile memory elements having resistive switching characteristics | Physics | 6 | Active |
| US8787066B2 | Method for forming resistive switching memory elements with improved switching behavior | Electricity | 6 | Active |
| US7696094B2 | Method for improved planarization in semiconductor devices | Electricity | 4 | Active |
| US9246096B2 | Atomic layer deposition of metal oxides for memory applications | Electricity | 3 | Active |
| US8913418B2 | Confined defect profiling within resistive random memory access cells | Physics | 3 | Active |
| US7972962B2 | Planarization method using hybrid oxide and polysilicon CMP | Electricity | 3 | Active |
| US8466446B2 | Atomic layer deposition of metal oxide materials for memory applications | Electricity | 3 | Active |
| US8912518B2 | Resistive random access memory cells having doped current limiting layers | Electricity | 3 | Active |
| US7829464B2 | Planarization method using hybrid oxide and polysilicon CMP | Electricity | 2 | Active |
| US8546275B2 | Atomic layer deposition of hafnium and zirconium oxides for memory applications | Electricity | 2 | Active |
| US8735217B2 | Multifunctional electrode | Electricity | 2 | Active |
| US7569500B2 | ALD metal oxide deposition process using direct oxidation | Electricity | 2 | Active |
| US9444047B2 | Embedded nonvolatile memory elements having resistive switching characteristics | Physics | 1 | Active |
| US8846443B2 | Atomic layer deposition of metal oxides for memory applications | Electricity | 1 | Active |
| US8741698B2 | Atomic layer deposition of zirconium oxide for forming resistive-switching materials | Electricity | 1 | Active |
| US8906736B1 | Multifunctional electrode | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.