Wei-Barn Chen
11Patents
2h-index
12Co-inventors
43Inventor score
Filing activity: Feb 13, 2014 → May 9, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9209304B2 | N/P MOS FinFET performance enhancement by specific orientation surface | Electricity | 3 | Active |
| US11309423B2 | Fin field effect transistor (finFET) device structure and method for forming the same | Electricity | 2 | Active |
| US10276720B2 | Method for forming fin field effect transistor (FINFET) device structure | Electricity | 2 | Active |
| US10957695B2 | Asymmetric gate pitch | Electricity | 0 | Active |
| US10483167B2 | Method for manufacturing dual FinFET device | Electricity | 0 | Active |
| US11949014B2 | Fin field effect transistor (FinFet) device structure and method for forming the same | Electricity | 0 | Active |
| US10475790B2 | Asymmetric gate pitch | Electricity | 0 | Active |
| US9859129B2 | Semiconductor device and manufacturing method of the same | Electricity | 0 | Active |
| US11328958B2 | Semiconductor device having planar transistor and FinFET | Electricity | 0 | Active |
| US10818555B2 | Semiconductor device having planar transistor and FinFET | Electricity | 0 | Active |
| US12009262B2 | Semiconductor device having planar transistor and FinFET | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.