Yosuke Ota
36Patents
5h-index
27Co-inventors
65Inventor score
Filing activity: Nov 4, 2008 → Aug 26, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8076251B2 | Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus | Electricity | 469 | Active |
| US8415258B2 | Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus | Electricity | 464 | Active |
| US8252701B2 | Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus | Electricity | 10 | Active |
| US9018104B2 | Method for manufacturing semiconductor device, method for processing substrate and substrate processing apparatus | Electricity | 7 | Active |
| US8367557B2 | Method of forming an insulation film having low impurity concentrations | Electricity | 5 | Active |
| US8202809B2 | Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus | Electricity | 4 | Active |
| US8575042B2 | Method of manufacturing semiconductor device and method of processing substrate and substrate processing apparatus | Electricity | 4 | Active |
| US8809204B2 | Method of manufacturing semiconductor device and substrate processing apparatus | Electricity | 3 | Active |
| US9123530B2 | Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus | Electricity | 3 | Active |
| US9685038B2 | Game system, and control method and storage medium employed therein | Human Necessities | 3 | Active |
| US9334567B2 | Method for manufacturing semiconductor device, method for processing substrate and substrate processing apparatus | Electricity | 3 | Active |
| US8410003B2 | Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus | Electricity | 3 | Active |
| US10145997B2 | Polarizing plate and polarizing plate assembly | Physics | 1 | Active |
| US9966251B2 | Method of manufacturing semiconductor device and substrate processing apparatus | Electricity | 1 | Active |
| US10690824B2 | Optical laminate | Chemistry; Metallurgy | 1 | Active |
| US9011601B2 | Substrate processing apparatus | Electricity | 1 | Active |
| US9269566B2 | Substrate processing apparatus | Electricity | 1 | Active |
| US9039838B2 | Method of manufacturing semiconductor device and substrate processing apparatus | Electricity | 1 | Active |
| US8901014B2 | Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus and non-transitory computer readable recording medium | Electricity | 1 | Active |
| US8174190B2 | Dispersion liquid for near-infrared-absorbing adhesive-body, near-infrared-absorbing adhesive body, near-infrared-absorbing plasma-display-panel filter, and plasma display panel | Physics | 1 | Active |
| US9217199B2 | Substrate processing apparatus | Electricity | 1 | Active |
| US9966252B2 | Method of manufacturing semiconductor device and substrate processing apparatus | Electricity | 1 | Active |
| US9761437B2 | Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus | Electricity | 1 | Active |
| US11634639B2 | Polarizing film, method for manufacturing same, polarizing plate, and display device | Chemistry; Metallurgy | 0 | Active |
| US10553860B2 | Covered lithium-nickel composite oxide particles, and method for manufacturing covered lithium-nickel composite oxide particles | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.