Yuichi Matsui
39Patents
10h-index
41Co-inventors
75Inventor score
Filing activity: Mar 31, 1987 → Dec 7, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5086014A | Schottky diode manufacturing process employing the synthesis of a polycrystalline diamond thin film | Emerging Cross-Sectional Technologies | 43 | Expired |
| US6451665B1 | Method of manufacturing a semiconductor integrated circuit | Electricity | 31 | Expired |
| US5107315A | MIS type diamond field-effect transistor with a diamond insulator undercoat | Electricity | 29 | Expired |
| US6743739B2 | Fabrication method for semiconductor integrated devices | Electricity | 27 | Expired |
| US6326218A | Semiconductor integrated circuit and its manufacturing method | Electricity | 25 | Expired |
| US7408218B2 | Semiconductor device having plural dram memory cells and a logic circuit | Electricity | 24 | Expired |
| US7667218B2 | Semiconductor integrated circuit device and method of manufacturing the same | Electricity | 17 | Expired |
| US4894691A | Compound semiconductor device with superlattice channel region | Electricity | 12 | Expired |
| US6503791B2 | Method of manufacturing semiconductor devices utilizing underlayer-dependency of deposition of capacitor electrode film, and semiconductor device | Electricity | 11 | Expired |
| US6992022B2 | Fabrication method for semiconductor integrated devices | Electricity | 10 | Expired |
| US7728376B2 | Semiconductor memory device | Electricity | 9 | Active |
| US6555429B2 | Method of manufacturing semiconductor devices utilizing underlayer-dependency of deposition of capacitor electrode film, and semiconductor device | Electricity | 9 | Expired |
| US7112819B2 | Semiconductor device and manufacturing method thereof | Electricity | 8 | Expired |
| US6833577B2 | Semiconductor device | Electricity | 8 | Expired |
| US8000126B2 | Semiconductor device with recording layer containing indium, germanium, antimony and tellurium | Electricity | 8 | Active |
| US7638786B2 | Semiconductor and semiconductor manufacturing arrangements having a chalcogenide layer formed of columnar crystal grains perpendicular to a main substrate surface | Electricity | 7 | Expired |
| US6483143B2 | Semiconductor device having a capacitor structure including a self-alignment deposition preventing film | Electricity | 7 | Expired |
| US6534375B2 | METHOD OF FORMING A CAPACITOR IN A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING A METAL SILICON NITRIDE LAYER TO PROTECT AN UNDERLYING METAL SILICIDE LAYER FROM OXIDATION DURING SUBSEQUENT PROCESSING STEPS | Electricity | 7 | Expired |
| US7683419B2 | Semiconductor device having plural DRAM memory cells and a logic circuit and method for manufacturing the same | Electricity | 6 | Active |
| US8106441B2 | Semiconductor device having plural DRAM memory cells and a logic circuit and method for manufacturing the same | Electricity | 6 | Active |
| US6720603B2 | CAPACITOR STRUCTURE AND A SEMICONDUCTOR DEVICE WITH A FIRST METAL LAYER, A SECOND METAL SILICIDE LAYER FORMED OVER THE FIRST METAL LAYER AND A SECOND METAL LAYER FORMED OVER THE SECOND METAL SILICIDE LAYER | Electricity | 5 | Expired |
| US8044489B2 | Semiconductor device with fluorine-containing interlayer dielectric film to prevent chalcogenide material layer from exfoliating from the interlayer dielectric film and process for producing the same | Emerging Cross-Sectional Technologies | 5 | Active |
| US8833857B2 | Vehicle seat | Performing Operations; Transporting | 4 | Active |
| US7804118B2 | Semiconductor device having plural DRAM memory cells and a logic circuit and method for manufacturing the same | Electricity | 4 | Active |
| US4823171A | Compound semiconductor device | Electricity | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.