BethAnn Rainey
24Patents
10h-index
49Co-inventors
67Inventor score
Filing activity: Dec 19, 2002 → Nov 28, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6794718B2 | High mobility crystalline planes in double-gate CMOS technology | Electricity | 198 | Expired |
| US7115920B2 | FinFET transistor and circuit | Electricity | 163 | Expired |
| US6909147B2 | Multi-height FinFETS | Electricity | 120 | Expired |
| US6888199B2 | High-density split-gate FinFET | Electricity | 63 | Expired |
| US6992354B2 | FinFET having suppressed parasitic device characteristics | Electricity | 27 | Expired |
| US8021943B2 | Simultaneously formed isolation trench and through-box contact for silicon-on-insulator technology | Electricity | 19 | Active |
| US7288802B2 | Virtual body-contacted trigate | Electricity | 14 | Expired |
| US6869852B1 | Self-aligned raised extrinsic base bipolar transistor structure and method | Electricity | 13 | Expired |
| US6953726B2 | High-density split-gate FinFET | Electricity | 11 | Expired |
| US6965133B2 | Method of base formation in a BiCMOS process | Electricity | 10 | Expired |
| US7087506B2 | Method of forming freestanding semiconductor layer | Electricity | 10 | Expired |
| US7904868B2 | Structures including means for lateral current carrying capability improvement in semiconductor devices | Electricity | 7 | Active |
| US7700446B2 | Virtual body-contacted trigate | Electricity | 6 | Active |
| US8748285B2 | Noble gas implantation region in top silicon layer of semiconductor-on-insulator substrate | Electricity | 4 | Active |
| US7470578B2 | Method of making a finFET having suppressed parasitic device characteristics | Electricity | 3 | Expired |
| US7368355B2 | FinFET transistor and circuit | Electricity | 3 | Active |
| US8778737B2 | Flattened substrate surface for substrate bonding | Electricity | 3 | Active |
| US7390721B2 | Methods of base formation in a BiCMOS process | Electricity | 3 | Active |
| US7453151B2 | Methods for lateral current carrying capability improvement in semiconductor devices | Electricity | 2 | Active |
| US7709892B2 | Semiconductor device having freestanding semiconductor layer | Electricity | 2 | Active |
| US7964466B2 | FinFET transistor and circuit | Electricity | 1 | Active |
| US8227318B2 | Integration of multiple gate oxides with shallow trench isolation methods to minimize divot formation | Electricity | 1 | Active |
| US7777276B2 | FinFET transistor and circuit | Electricity | 0 | Active |
| US7814454B2 | Selectable device options for characterizing semiconductor devices | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.