Inventor · Boise, ID, US

Bradley J. Howard

59Patents
12h-index
34Co-inventors
84Inventor score

Filing activity: Mar 3, 1995 → Mar 23, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US8980758B1 Methods for etching an etching stop layer utilizing a cyclical etching process Electricity 187 Active
US9287095B2 Semiconductor system assemblies and methods of operation Electricity 152 Active
US9543163B2 Methods for forming features in a material layer utilizing a combination of a main etching and a cyclical etching process Electricity 113 Active
US5438011A Method of forming a capacitor using a photoresist contact sidewall having standing wave ripples Emerging Cross-Sectional Technologies 102 Expired
US5897372A Formation of a self-aligned integrated circuit structure using silicon-rich nitride as a protective layer Electricity 34 Expired
US6232219A Self-limiting method of reducing contamination in a contact opening, method of making contacts and semiconductor devices therewith, and resulting structures Electricity 31 Expired
US5750441A Mask having a tapered profile used during the formation of a semiconductor device Electricity 27 Expired
US6350706B1 Process for using photo-definable layers in the manufacture of semiconductor devices and resulting structures of same Electricity 16 Expired
US5966611A Semiconductor processing for forming capacitors by etching polysilicon and coating layer formed over the polysilicon Electricity 14 Expired
US5711851A Process for improving the performance of a temperature-sensitive etch process Electricity 14 Expired
US5686357A Method for forming a contact during the formation of a semiconductor device Electricity 12 Expired
US6056850A Apparatus for improving the performance of a temperature-sensitive etch process Electricity 12 Expired
US5851916A Formation of a self-aligned integrated circuit structures using planarization to form a top surface Electricity 11 Expired
US5888877A Method of forming recessed container cells Electricity 11 Expired
US7625460B2 Multifrequency plasma reactor Electricity 10 Expired
US6221205A Apparatus for improving the performance of a temperature-sensitive etch Electricity 9 Expired
US6716763B2 Method of controlling striations and CD loss in contact oxide etch Electricity 9 Expired
US6753264B2 Method of controlling striations and CD loss in contact oxide etch Electricity 9 Expired
US7884925B2 Electrical and optical system and methods for monitoring erosion of electrostatic chuck edge bead materials Electricity 9 Active
US7122480B2 Method of plasma etching a substrate Electricity 8 Expired
US6117767A Method of forming an integrated circuit structure Electricity 8 Expired
US6025271A Method of removing surface defects or other recesses during the formation of a semiconductor device Electricity 8 Expired
US6127239A Semiconductor processing methods, and methods of forming capacitors Electricity 7 Expired
US6335292B1 Method of controlling striations and CD loss in contact oxide etch Electricity 7 Expired
US5970358A Method for forming a capacitor wherein the first capacitor plate includes electrically coupled conductive layers separated by an intervening insulative layer Electricity 6 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.