Inventor · Portland, OR, US

Chad Rue

27Patents
5h-index
33Co-inventors
69Inventor score

Filing activity: Dec 12, 2002 → Jun 22, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US7119333B2 Ion detector for ion beam applications Electricity 21 Expired
US8455822B2 Navigation and sample processing using an ion source containing both low-mass and high-mass species Electricity 13 Active
US7351966B1 High-resolution optical channel for non-destructive navigation and processing of integrated circuits Electricity 8 Active
US9064811B2 Precursor for planar deprocessing of semiconductor devices using a focused ion beam Electricity 7 Active
US8059918B2 High accuracy beam placement for local area navigation Electricity 6 Active
US6900137B2 Dry etch process to edit copper lines Electricity 4 Expired
US8610092B2 Charged particle beam processing system with visual and infrared imaging Electricity 3 Active
US6946064B2 Sample mount for performing sputter-deposition in a focused ion beam (FIB) tool Electricity 2 Expired
US8358832B2 High accuracy beam placement for local area navigation Electricity 2 Active
US10546719B2 Face-on, gas-assisted etching for plan-view lamellae preparation Electricity 2 Active
US9443697B2 Low energy ion beam etch Electricity 2 Active
US11651924B1 Method of producing microrods for electron emitters, and associated microrods and electron emitters Electricity 1 Active
US9087366B2 High accuracy beam placement for local area navigation Electricity 1 Active
US8781219B2 High accuracy beam placement for local area navigation Electricity 1 Active
US9983152B1 Material characterization using ion channeling imaging Physics 1 Active
US10190953B2 Tomography sample preparation systems and methods with improved speed, automation, and reliability Electricity 1 Active
US11798804B2 Method of material deposition Electricity 0 Active
US10347463B2 Enhanced charged particle beam processes for carbon removal Electricity 0 Active
US6843893B2 Metal dry etch using electronic field Chemistry; Metallurgy 0 Expired
US10930514B2 Method and apparatus for the planarization of surfaces Electricity 0 Active
US9761467B2 Gas injection system with precursor for planar deprocessing of semiconductor devices using a focused ion beam Electricity 0 Active
US7781733B2 In-situ high-resolution light-optical channel for optical viewing and surface processing in parallel with charged particle (FIB and SEM) techniques Electricity 0 Active
US10325754B2 Ion implantation to alter etch rate Emerging Cross-Sectional Technologies 0 Active
US11069523B2 Method of material deposition Electricity 0 Active
US9978586B2 Method of material deposition Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.