Changhua Liu
14Patents
1h-index
40Co-inventors
46Inventor score
Filing activity: Mar 29, 2014 → Sep 30, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11088103B2 | First layer interconnect first on carrier approach for EMIB patch | Electricity | 1 | Active |
| US12164147B2 | Device, method and system for optical communication with a waveguide structure and an integrated optical coupler of a photonic integrated circuit chip | Physics | 1 | Active |
| US11837534B2 | Substrate with variable height conductive and dielectric elements | Electricity | 1 | Active |
| US10403564B2 | Dual-damascene zero-misalignment-via process for semiconductor packaging | Electricity | 0 | Active |
| US11644757B2 | Method to achieve tilted patterning with a through resist thickness using projection optics | Performing Operations; Transporting | 0 | Active |
| US12345932B2 | Die last and waveguide last architecture for silicon photonic packaging | Physics | 0 | Active |
| US12341117B2 | Methods and apparatus to reduce defects in interconnects between semiconductor dies and package substrates | Electricity | 0 | Active |
| US11264307B2 | Dual-damascene zero-misalignment-via process for semiconductor packaging | Electricity | 0 | Active |
| US11586112B2 | Method to achieve tilted patterning with a through resist thickness | Electricity | 0 | Active |
| US12298572B2 | Device, method and system for optical communication with a photonic integrated circuit chip and a transverse oriented lens structure | Physics | 0 | Active |
| US12354992B2 | First layer interconnect first on carrier approach for EMIB patch | Electricity | 0 | Active |
| US10438812B2 | Anisotropic etching systems and methods using a photochemically enhanced etchant | Electricity | 0 | Active |
| US10078204B2 | Non-destructive 3-dimensional chemical imaging of photo-resist material | Physics | 0 | Active |
| US11506982B2 | Prism-mask for angled patterning applications | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.