Inventor · White Plains, NY, US

Daniel C. Edelstein

312Patents
39h-index
278Co-inventors
93Inventor score

Filing activity: Apr 11, 1990 → Sep 23, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US7084079B2 Method for low temperature chemical vapor deposition of low-k films using selected cyclosiloxane and ozone gases for semiconductor applications Electricity 577 Expired
US6531412B2 Method for low temperature chemical vapor deposition of low-k films using selected cyclosiloxane and ozone gases for semiconductor applications Electricity 518 Expired
US6153935A Dual etch stop/diffusion barrier for damascene interconnects Electricity 315 Expired
US6323128A Method for forming Co-W-P-Au films Electricity 259 Expired
US9496239B1 Nitride-enriched oxide-to-oxide 3D wafer bonding Electricity 218 Active
US9620481B2 Substrate bonding with diffusion barrier structures Electricity 197 Active
US9941241B2 Method for wafer-wafer bonding Electricity 196 Active
US6181012A Copper interconnection structure incorporating a metal seed layer Electricity 185 Expired
US5793272A Integrated circuit toroidal inductor Emerging Cross-Sectional Technologies 181 Expired
US5884990A Integrated circuit inductor Emerging Cross-Sectional Technologies 174 Expired
US9064874B2 Interconnect with titanium—oxide diffusion barrier Electricity 168 Active
US6114937A Integrated circuit spiral inductor Emerging Cross-Sectional Technologies 149 Expired
US5559367A Diamond-like carbon for use in VLSI and ULSI interconnect systems Electricity 132 Expired
US6103096A Apparatus and method for the electrochemical etching of a wafer Electricity 120 Expired
US7276787B2 Silicon chip carrier with conductive through-vias and method for fabricating same Electricity 90 Expired
US6234870A Serial intelligent electro-chemical-mechanical wafer processor Performing Operations; Transporting 85 Expired
US6153043A Elimination of photo-induced electrochemical dissolution in chemical mechanical polishing Electricity 82 Expired
US6335104B1 Method for preparing a conductive pad for electrical connection and conductive pad formed Emerging Cross-Sectional Technologies 81 Expired
US9324650B2 Interconnect structures with fully aligned vias Electricity 76 Active
US6358832B1 Method of forming barrier layers for damascene interconnects Electricity 68 Expired
US8525169B1 Reliable physical unclonable function for device authentication Electricity 66 Active
US6649531B2 Process for forming a damascene structure Electricity 60 Expired
US7033927B2 Apparatus and method for thermal isolation, circuit cooling and electromagnetic shielding of a wafer Electricity 60 Expired
US6054329A Method of forming an integrated circuit spiral inductor with ferromagnetic liner Emerging Cross-Sectional Technologies 55 Expired
US5679269A Diamond-like carbon for use in VLSI and ULSI interconnect systems Electricity 55 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.