Do-Haing Lee
19Patents
6h-index
38Co-inventors
66Inventor score
Filing activity: Feb 28, 2002 → Apr 7, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7919142B2 | Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the same | Chemistry; Metallurgy | 406 | Active |
| US7564042B2 | Ion beam apparatus having plasma sheath controller | Electricity | 13 | Active |
| US6926799B2 | Etching apparatus using neutral beam | Electricity | 13 | Expired |
| US6933495B1 | 3-grid neutral beam source used for etching semiconductor device | Electricity | 9 | Expired |
| US8900944B2 | Methods of manufacturing a semiconductor device | Electricity | 8 | Active |
| US7858464B2 | Methods of manufacturing non-volatile memory devices having insulating layers treated using neutral beam irradiation | Electricity | 7 | Active |
| US7060931B2 | Neutral beam source having electromagnet used for etching semiconductor device | Electricity | 4 | Expired |
| US7629589B2 | Apparatus and method for controlling ion beam | Electricity | 4 | Active |
| US6874443B2 | Layer-by-layer etching apparatus using neutral beam and etching method using the same | Electricity | 3 | Expired |
| US9401359B2 | Semiconductor device | Electricity | 3 | Active |
| US10879244B2 | Integrated circuit device | Electricity | 2 | Active |
| US9293343B2 | Method of forming patterns of semiconductor device | Electricity | 2 | Active |
| US7094702B2 | Layer-by-layer etching apparatus using neutral beam and method of etching using the same | Electricity | 2 | Expired |
| US8450680B2 | Apparatus and method for processing substrate using neutralized beams including applying a voltage to a substrate support | Electricity | 1 | Active |
| US11776962B2 | Method of manufacturing integrated circuit device | Electricity | 0 | Active |
| US11329044B2 | Integrated circuit device | Electricity | 0 | Active |
| US8089042B2 | Apparatus and method for processing substrate using neutralized beams including applying a voltage to a substrate support | Electricity | 0 | Active |
| US11848364B2 | Semiconductor device and method of fabricating the same | Electricity | 0 | Active |
| US8318412B2 | Method of manufacturing semiconductor device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.