Edwin C. Suarez
20Patents
4h-index
37Co-inventors
63Inventor score
Filing activity: May 2, 2003 → Aug 4, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6830624B2 | Blocker plate by-pass for remote plasma clean | Chemistry; Metallurgy | 306 | Expired |
| US9355922B2 | Systems and methods for internal surface conditioning in plasma processing equipment | Electricity | 147 | Active |
| US9966240B2 | Systems and methods for internal surface conditioning assessment in plasma processing equipment | Electricity | 100 | Active |
| USD1038049S1 | Cover ring for use in semiconductor processing chamber | General | 13 | Active |
| US11400560B2 | Retaining ring design | Electricity | 4 | Active |
| US10589399B2 | Textured small pad for chemical mechanical polishing | Performing Operations; Transporting | 2 | Active |
| USD1059312S1 | Deposition ring of a process kit for semiconductor substrate processing | General | 2 | Active |
| USD600956S1 | Machine cabinet | General | 1 | Expired |
| US11996315B2 | Thin substrate handling via edge clamping | Electricity | 1 | Active |
| US10593523B2 | Systems and methods for internal surface conditioning in plasma processing equipment | Electricity | 0 | Active |
| US12100579B2 | Deposition ring for thin substrate handling via edge clamping | Electricity | 0 | Active |
| US12340979B2 | Semiconductor processing chamber for improved precursor flow | Electricity | 0 | Active |
| US10490418B2 | Systems and methods for internal surface conditioning assessment in plasma processing equipment | Electricity | 0 | Active |
| USD1064005S1 | Grounding ring of a process kit for semiconductor substrate processing | General | 0 | Active |
| US10707061B2 | Systems and methods for internal surface conditioning in plasma processing equipment | Electricity | 0 | Active |
| US10610994B2 | Polishing system with local area rate control and oscillation mode | Electricity | 0 | Active |
| US9850576B2 | Anti-arc zero field plate | Electricity | 0 | Active |
| USD1069863S1 | Deposition ring of a process kit for semiconductor substrate processing | General | 0 | Active |
| US10796922B2 | Systems and methods for internal surface conditioning assessment in plasma processing equipment | Electricity | 0 | Active |
| US10434623B2 | Local area polishing system and polishing pad assemblies for a polishing system | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.