Eisuke Nishitani
59Patents
14h-index
92Co-inventors
87Inventor score
Filing activity: Nov 30, 1987 → Apr 21, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5574247A | CVD reactor apparatus | Chemistry; Metallurgy | 545 | Expired |
| US6483989B1 | Substrate processing apparatus and semiconductor device producing method | Electricity | 530 | Expired |
| US9412582B2 | Reaction tube, substrate processing apparatus, and method of manufacturing semiconductor device | Chemistry; Metallurgy | 448 | Active |
| US6875280B2 | Substrate processing apparatus and substrate processing method | Electricity | 192 | Expired |
| US5498768A | Process for forming multilayer wiring | Emerging Cross-Sectional Technologies | 49 | Expired |
| US8517518B2 | Recording apparatus and liquid ejection head | Performing Operations; Transporting | 39 | Active |
| US6171641A | Vacuum processing apparatus, and a film deposition apparatus and a film deposition method both using the vacuum processing apparatus | Electricity | 35 | Expired |
| US5815396A | Vacuum processing device and film forming device and method using same | Electricity | 29 | Expired |
| US5707500A | Vacuum processing equipment, film coating equipment and deposition method | Electricity | 25 | Expired |
| US6414280B1 | Heat treatment method and heat treatment apparatus | Electricity | 21 | Expired |
| US5670421A | Process for forming multilayer wiring | Emerging Cross-Sectional Technologies | 18 | Expired |
| US4979466A | Apparatus for selective deposition of metal thin film | Chemistry; Metallurgy | 17 | Expired |
| US10040290B2 | Liquid ejection head, liquid ejection apparatus, and method of supplying liquid | Performing Operations; Transporting | 15 | Active |
| US4830891A | Method for selective deposition of metal thin film | Chemistry; Metallurgy | 14 | Expired |
| US6472639B2 | Heat treatment method and heat treatment apparatus | Electricity | 12 | Expired |
| US8794745B2 | Liquid ejection head and liquid ejection method | Performing Operations; Transporting | 11 | Active |
| US9527314B2 | Ink jet recording method | Performing Operations; Transporting | 11 | Active |
| US7049187B2 | Manufacturing method of polymetal gate electrode | Electricity | 11 | Expired |
| US8833909B2 | Liquid ejection head and liquid ejection method | Performing Operations; Transporting | 9 | Active |
| US7300833B2 | Process for producing semiconductor integrated circuit device | Electricity | 7 | Active |
| US7144766B2 | Method of manufacturing semiconductor integrated circuit device having polymetal gate electrode | Electricity | 6 | Expired |
| US9707751B2 | Transfer-type ink jet recording apparatus | Physics | 5 | Active |
| US8481434B2 | Method of manufacturing a semiconductor device and processing apparatus | Electricity | 5 | Active |
| US9340050B2 | Ink jet recording apparatus and ink jet recording method | Performing Operations; Transporting | 5 | Active |
| US10179453B2 | Liquid ejection head and liquid ejection apparatus | Performing Operations; Transporting | 5 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.