Inventor · Brookline, MA, US

Jeffrey B. Miller

19Patents
3h-index
40Co-inventors
56Inventor score

Filing activity: Aug 16, 2011 → May 11, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US8709114B2 Method of manufacturing chemical mechanical polishing layers Performing Operations; Transporting 27 Active
US8986585B2 Method of manufacturing chemical mechanical polishing layers having a window Performing Operations; Transporting 26 Active
US11929466B2 Electrochemical energy storage devices Emerging Cross-Sectional Technologies 3 Active
US8444727B2 Method of manufacturing chemical mechanical polishing layers Performing Operations; Transporting 2 Active
US10079322B2 Necklaces of silicon nanowires Emerging Cross-Sectional Technologies 2 Active
US9449855B2 Double-etch nanowire process Emerging Cross-Sectional Technologies 2 Active
US10629759B2 Metal-assisted etch combined with regularizing etch Emerging Cross-Sectional Technologies 1 Active
US9768331B2 Screen printing electrical contacts to nanowire areas Emerging Cross-Sectional Technologies 1 Active
US9630293B2 Chemical mechanical polishing pad composite polishing layer formulation Electricity 1 Active
US10269995B2 Screen printing electrical contacts to nanostructured areas Emerging Cross-Sectional Technologies 1 Active
US9783895B2 Double-etch nanowire process Emerging Cross-Sectional Technologies 1 Active
US10144115B2 Method of making polishing layer for chemical mechanical polishing pad Performing Operations; Transporting 0 Active
US10092998B2 Method of making composite polishing layer for chemical mechanical polishing pad Performing Operations; Transporting 0 Active
US10105825B2 Method of making polishing layer for chemical mechanical polishing pad Performing Operations; Transporting 0 Active
US9586305B2 Chemical mechanical polishing pad and method of making same Emerging Cross-Sectional Technologies 0 Active
US9034063B2 Method of manufacturing grooved chemical mechanical polishing layers Performing Operations; Transporting 0 Active
US10005172B2 Controlled-porosity method for forming polishing pad Performing Operations; Transporting 0 Active
US10011002B2 Method of making composite polishing layer for chemical mechanical polishing pad Performing Operations; Transporting 0 Active
US9776300B2 Chemical mechanical polishing pad and method of making same Performing Operations; Transporting 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.