Jochen Beintner
68Patents
16h-index
68Co-inventors
87Inventor score
Filing activity: Sep 26, 1997 → May 30, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7683428B2 | Vertical Fin-FET MOS devices | Electricity | 212 | Expired |
| US7470570B2 | Process for fabrication of FinFETs | Electricity | 132 | Active |
| US6177698A | Formation of controlled trench top isolation layers for vertical transistors | Electricity | 100 | Expired |
| US7018551B2 | Pull-back method of forming fins in FinFets | Electricity | 59 | Expired |
| US7091566B2 | Dual gate FinFet | Electricity | 53 | Expired |
| US7410844B2 | Device fabrication by anisotropic wet etch | Electricity | 50 | Active |
| US6924178B2 | Oxide/nitride stacked in FinFET spacer process | Electricity | 35 | Expired |
| US7087471B2 | Locally thinned fins | Electricity | 35 | Expired |
| US6265742A | Memory cell structure and fabrication | Electricity | 34 | Expired |
| US6998666B2 | Nitrided STI liner oxide for reduced corner device impact on vertical device performance | Electricity | 29 | Expired |
| US6967147B1 | Nitrogen implantation using a shadow effect to control gate oxide thickness in DRAM semiconductor | Emerging Cross-Sectional Technologies | 24 | Expired |
| US6093614A | Memory cell structure and fabrication | Electricity | 22 | Expired |
| US6566228B1 | Trench isolation processes using polysilicon-assisted fill | Electricity | 21 | Expired |
| US6323103A | Method for fabricating transistors | Electricity | 21 | Expired |
| US6184091A | Formation of controlled trench top isolation layers for vertical transistors | Electricity | 20 | Expired |
| US6013937A | Buffer layer for improving control of layer thickness | Emerging Cross-Sectional Technologies | 18 | Expired |
| US6746933B1 | Pitcher-shaped active area for field effect transistor and method of forming same | Electricity | 16 | Expired |
| US7087952B2 | Dual function FinFET, finmemory and method of manufacture | Electricity | 16 | Expired |
| US6204140A | Dynamic random access memory | Electricity | 16 | Expired |
| US7323374B2 | Dense chevron finFET and method of manufacturing same | Electricity | 16 | Expired |
| US6607984B1 | Removable inorganic anti-reflection coating process | Electricity | 14 | Expired |
| US6933183B2 | Selfaligned source/drain FinFET process flow | Electricity | 14 | Expired |
| US6579759B1 | Formation of self-aligned buried strap connector | Electricity | 12 | Expired |
| US6074903A | Method for forming electrical isolation for semiconductor devices | Electricity | 12 | Expired |
| US6602745B2 | Field effect transistor and method of fabrication | Electricity | 12 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.