Inventor · Sunnyvale, CA, US

Krishna Nittala

19Patents
2h-index
49Co-inventors
50Inventor score

Filing activity: Aug 20, 2014 → Mar 15, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US9245739B2 Low-K oxide deposition by hydrolysis and condensation Electricity 14 Active
US10490436B2 Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films Electricity 3 Active
US11721545B2 Method of using dual frequency RF power in a process chamber Electricity 1 Active
US11618949B2 Methods to reduce material surface roughness Electricity 1 Active
US11694902B2 Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers Electricity 1 Active
US11508611B2 Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films Electricity 0 Active
US11939674B2 Methods to reduce material surface roughness Electricity 0 Active
US11170990B2 Polysilicon liners Electricity 0 Active
US11443919B2 Film formation via pulsed RF plasma Electricity 0 Active
US12334358B2 Integration processes utilizing boron-doped silicon materials Electricity 0 Active
US12131913B2 Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers Electricity 0 Active
US11532525B2 Controlling concentration profiles for deposited films using machine learning Electricity 0 Active
US11562902B2 Hydrogen management in plasma deposited films Electricity 0 Active
US12106958B2 Method of using dual frequency RF power in a process chamber Electricity 0 Active
US11827514B2 Amorphous silicon-based films resistant to crystallization Chemistry; Metallurgy 0 Active
US11961739B2 Boron concentration tunability in boron-silicon films Electricity 0 Active
US11421324B2 Hardmasks and processes for forming hardmasks by plasma-enhanced chemical vapor deposition Electricity 0 Active
US11676813B2 Doping semiconductor films Electricity 0 Active
US12205818B2 Boron concentration tunability in boron-silicon films Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.