Mark Liu
51Patents
10h-index
54Co-inventors
81Inventor score
Filing activity: Aug 10, 2000 → Nov 6, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7456068B2 | Forming ultra-shallow junctions | Electricity | 51 | Active |
| US7052978B2 | Arrangements incorporating laser-induced cleaving | Performing Operations; Transporting | 49 | Expired |
| US8901537B2 | Transistors with high concentration of boron doped germanium | Electricity | 47 | Active |
| US6590271B2 | Extension of shallow trench isolation by ion implantation | Electricity | 29 | Expired |
| US6432798B1 | Extension of shallow trench isolation by ion implantation | Electricity | 25 | Expired |
| US7211501B2 | Method and apparatus for laser annealing | Emerging Cross-Sectional Technologies | 23 | Expired |
| US7663192B2 | CMOS device and method of manufacturing same | Electricity | 23 | Active |
| US8896030B2 | Integrated circuits with selective gate electrode recess | Electricity | 19 | Active |
| US9627384B2 | Transistors with high concentration of boron doped germanium | Electricity | 12 | Active |
| US6675057B2 | Integrated circuit annealing methods and apparatus | Electricity | 12 | Expired |
| US7741230B2 | Highly-selective metal etchants | Electricity | 9 | Active |
| US9443980B2 | Pulsed laser anneal process for transistors with partial melt of a raised source-drain | Electricity | 6 | Active |
| US7115479B2 | Sacrificial annealing layer for a semiconductor device and a method of fabrication | Electricity | 5 | Expired |
| US6936518B2 | Creating shallow junction transistors | Electricity | 4 | Expired |
| US8779477B2 | Enhanced dislocation stress transistor | Electricity | 4 | Active |
| US9418898B2 | Integrated circuits with selective gate electrode recess | Electricity | 4 | Active |
| US10020232B2 | Integrated circuits with recessed gate electrodes | Electricity | 3 | Active |
| US11570405B2 | Systems and methods for facilitating external control of user-controlled avatars in a virtual environment in order to trigger livestream communications between users | Electricity | 3 | Active |
| US10170314B2 | Pulsed laser anneal process for transistor with partial melt of a raised source-drain | Electricity | 2 | Active |
| US7439571B2 | Method for fabricating metal gate structures | Electricity | 2 | Expired |
| US11217582B2 | Unidirectional self-aligned gate endcap (SAGE) architectures with gate-orthogonal walls | Electricity | 2 | Active |
| US11387320B2 | Transistors with high concentration of germanium | Electricity | 2 | Active |
| US10651093B2 | Integrated circuits with recessed gate electrodes | Electricity | 2 | Active |
| US11750774B2 | Systems and methods for triggering livestream communications between users based on proximity-based criteria for avatars within virtual environments that correspond to the users | Electricity | 1 | Active |
| US9006069B2 | Pulsed laser anneal process for transistors with partial melt of a raised source-drain | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.