Min-Ying Tsai
28Patents
2h-index
27Co-inventors
49Inventor score
Filing activity: Aug 31, 2015 → Feb 1, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10658410B2 | Image sensor having improved full well capacity and related method of formation | Electricity | 8 | Active |
| US10163949B2 | Image device having multi-layered refractive layer on back surface | Electricity | 3 | Active |
| US10163647B2 | Method for forming deep trench structure | Electricity | 2 | Active |
| US9754993B2 | Deep trench isolations and methods of forming the same | Electricity | 2 | Active |
| US11545513B2 | Image sensor having improved full well capacity and related method of formation | Electricity | 1 | Active |
| US10395974B1 | Method for forming a thin semiconductor-on-insulator (SOI) substrate | Electricity | 1 | Active |
| US11784204B2 | Enhanced trench isolation structure | Emerging Cross-Sectional Technologies | 1 | Active |
| US10971534B2 | Image sensor having improved full well capacity and related method of formation | Electricity | 1 | Active |
| US11398516B2 | Conductive contact for ion through-substrate via | Electricity | 1 | Active |
| US10923503B2 | Semiconductor-on-insulator (SOI) substrate comprising a trap-rich layer with small grain sizes | Electricity | 1 | Active |
| US11817469B2 | Light absorbing layer to enhance P-type diffusion for DTI in image sensors | Electricity | 1 | Active |
| US11171039B2 | Composite semiconductor substrate, semiconductor device and method for manufacturing the same | Electricity | 0 | Active |
| US12080738B2 | Image sensor having stacked metal oxide films as fixed charge film | Electricity | 0 | Active |
| US11069733B2 | Image sensor having improved full well capacity and related method of formation | Electricity | 0 | Active |
| US12349492B2 | Photodiode structure for image sensor | Electricity | 0 | Active |
| US12408448B2 | Deep trench isolation structure and methods for fabrication thereof | Electricity | 0 | Active |
| US10867834B2 | Semiconductor structure and manufacturing method thereof | Electricity | 0 | Active |
| US11101307B2 | Image sensor having stacked conformal films | Electricity | 0 | Active |
| US11929379B2 | Conductive contact for ion through-substrate via | Electricity | 0 | Active |
| US11869761B2 | Back-side deep trench isolation structure for image sensor | Electricity | 0 | Active |
| US11232975B2 | Semiconductor-on-insulator (SOI) substrate having dielectric structures that increase interface bonding strength | Electricity | 0 | Active |
| US12191191B2 | Semiconductor structure and manufacturing method thereof | Electricity | 0 | Active |
| US12087801B2 | Deep trench isolations and methods of forming the same | Electricity | 0 | Active |
| US12364048B2 | Conductive contact for ion through-substrate via | Electricity | 0 | Active |
| US11217621B2 | Deep trench isolations and methods of forming the same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.