Naresh Kumar Penta
15Patents
3h-index
22Co-inventors
52Inventor score
Filing activity: May 31, 2011 → May 16, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10119048B1 | Low-abrasive CMP slurry compositions with tunable selectivity | Electricity | 7 | Active |
| US8778203B2 | Tunable polish rates by varying dissolved oxygen content | Electricity | 4 | Active |
| US9150759B2 | Chemical mechanical polishing composition for polishing silicon wafers and related methods | Electricity | 3 | Active |
| US8795548B1 | Silicon wafer polishing composition and related methods | Electricity | 1 | Active |
| US10787592B1 | Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment | Electricity | 1 | Active |
| US10626298B1 | Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous silicon | Electricity | 1 | Active |
| US8801959B1 | Stable, concentratable silicon wafer polishing composition and related methods | Electricity | 0 | Active |
| US10822524B2 | Aqueous compositions of low dishing silica particles for polysilicon polishing | Electricity | 0 | Active |
| US10954411B2 | Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide | Electricity | 0 | Active |
| US10221336B2 | Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them | Emerging Cross-Sectional Technologies | 0 | Active |
| US10508221B2 | Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them | Electricity | 0 | Active |
| US10584265B2 | Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them | Chemistry; Metallurgy | 0 | Active |
| US10316218B2 | Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them | Emerging Cross-Sectional Technologies | 0 | Active |
| US11186748B2 | Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them | Electricity | 0 | Active |
| US10711158B2 | Aqueous silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of using them | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.