Inventor · Hopewell Junction, NY, US

Peter D. Hoh

16Patents
8h-index
37Co-inventors
68Inventor score

Filing activity: Mar 30, 1987 → Apr 8, 2002

Most-cited inventions

PatentTitleAreaCited byStatus
US4732871A Process for producing undercut dummy gate mask profiles for MESFETs Electricity 35 Expired
US5059552A Process for forming the ridge structure of a self-aligned semiconductor laser Emerging Cross-Sectional Technologies 29 Expired
US5874363A Polycide etching with HCL and chlorine Electricity 26 Expired
US6403423B1 Modified gate processing for optimized definition of array and logic devices on same chip Electricity 21 Expired
US6548357B2 Modified gate processing for optimized definition of array and logic devices on same chip Electricity 19 Expired
US6342722B1 Integrated circuit having air gaps between dielectric and conducting lines Electricity 15 Expired
US5309465A Ridge waveguide semiconductor laser with thin active region Electricity 8 Expired
US5939335A Method for reducing stress in the metallization of an integrated circuit Electricity 8 Expired
US6187412A Silicon article having columns and method of making Emerging Cross-Sectional Technologies 7 Expired
US5305340A Waveguide ridge laser device with improved mounting and ridge protection Electricity 6 Expired
US6208008A Integrated circuits having reduced stress in metallization Electricity 6 Expired
US6686296B1 Nitrogen-based highly polymerizing plasma process for etching of organic materials in semiconductor manufacturing Electricity 6 Expired
US6489005B1 Method of making silicon article having columns Emerging Cross-Sectional Technologies 5 Expired
US6228279A High-density plasma, organic anti-reflective coating etch system compatible with sensitive photoresist materials Electricity 4 Expired
US6486505B1 Semiconductor contact and method of forming the same Electricity 3 Expired
US6177348A Low temperature via fill using liquid phase transport Emerging Cross-Sectional Technologies 1 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.