Rene George
27Patents
7h-index
53Co-inventors
72Inventor score
Filing activity: Nov 16, 1998 → May 19, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6335293B1 | Systems and methods for two-sided etch of a semiconductor substrate | Electricity | 317 | Expired |
| US6379576B2 | Systems and methods for variable mode plasma enhanced processing of semiconductor wafers | Emerging Cross-Sectional Technologies | 19 | Expired |
| US7232767B2 | Slotted electrostatic shield modification for improved etch and CVD process uniformity | Electricity | 15 | Expired |
| US7276122B2 | Multi-workpiece processing chamber | Electricity | 15 | Expired |
| US9184072B2 | Advanced multi-workpiece processing chamber | Emerging Cross-Sectional Technologies | 13 | Active |
| US7799685B2 | System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing | Electricity | 10 | Active |
| US6624082B2 | Systems and methods for two-sided etch of a semiconductor substrate | Electricity | 7 | Expired |
| US8066815B2 | Multi-workpiece processing chamber | Electricity | 6 | Active |
| US9831091B2 | Plasma treating a process chamber | Electricity | 4 | Active |
| US11658006B2 | Plasma sources and plasma processing apparatus thereof | Electricity | 3 | Active |
| US11486038B2 | Asymmetric injection for better wafer uniformity | Electricity | 2 | Active |
| US8413604B2 | Slotted electrostatic shield modification for improved etch and CVD process uniformity | Electricity | 1 | Active |
| US11077410B2 | Gas injector with baffle | Performing Operations; Transporting | 1 | Active |
| US11854770B2 | Plasma processing with independent temperature control | Electricity | 1 | Active |
| US7947605B2 | Post ion implant photoresist strip using a pattern fill and method | Electricity | 1 | Active |
| US10290504B2 | Plasma treating a process chamber | Electricity | 1 | Active |
| US12272521B2 | Plasma sources and plasma processing apparatus thereof | Electricity | 0 | Active |
| US11885021B2 | Gas supply member with baffle | Electricity | 0 | Active |
| US11959169B2 | Asymmetric injection for better wafer uniformity | Electricity | 0 | Active |
| US11529592B2 | Gas injector with baffle | Performing Operations; Transporting | 0 | Active |
| US10971357B2 | Thin film treatment process | Electricity | 0 | Active |
| US12139790B2 | Processing system and method of delivering a reactant gas | Electricity | 0 | Active |
| US10504779B2 | Hydrogenation and nitridization processes for reducing oxygen content in a film | Electricity | 0 | Active |
| US12272531B2 | Dual pressure oxidation method for forming an oxide layer in a feature | Electricity | 0 | Active |
| US11124878B2 | Gas supply member with baffle | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.