Inventor · Redwood City, CA, US

Robert Chebi

25Patents
10h-index
34Co-inventors
75Inventor score

Filing activity: Jun 28, 1991 → Aug 19, 2016

Most-cited inventions

PatentTitleAreaCited byStatus
US7476291B2 High chamber temperature process and chamber design for photo-resist stripping and post-metal etch passivation Electricity 506 Active
US8298336B2 High strip rate downstream chamber Emerging Cross-Sectional Technologies 361 Active
US8425682B2 High strip rate downstream chamber Emerging Cross-Sectional Technologies 358 Active
US5279865A High throughput interlevel dielectric gap filling process Electricity 336 Expired
US6241845A Apparatus for reducing process drift in inductive coupled plasma etching such as oxide layer Electricity 232 Expired
US5451543A Straight sidewall profile contact opening to underlying interconnect and method for making the same Emerging Cross-Sectional Technologies 100 Expired
US6528427B2 Methods for reducing contamination of semiconductor substrates Emerging Cross-Sectional Technologies 52 Expired
US6048798A Apparatus for reducing process drift in inductive coupled plasma etching such as oxide layer Electricity 33 Expired
US7547635B2 Process for etching dielectric films with improved resist and/or etch profile characteristics Electricity 15 Expired
US6759336B1 Methods for reducing contamination of semiconductor substrates Emerging Cross-Sectional Technologies 10 Expired
US8173547B2 Silicon etch with passivation using plasma enhanced oxidation Electricity 8 Active
US7083903B2 Methods of etching photoresist on substrates Physics 8 Expired
US8598037B2 Silicon etch with passivation using plasma enhanced oxidation Electricity 7 Active
US8043434B2 Method and apparatus for removing photoresist Electricity 6 Active
US9330926B2 Fabrication of a silicon structure and deep silicon etch with profile control Electricity 4 Active
US9865472B2 Fabrication of a silicon structure and deep silicon etch with profile control Electricity 3 Active
US7824519B2 Variable volume plasma processing chamber and associated methods Electricity 3 Active
US9018098B2 Silicon etch with passivation using chemical vapor deposition Electricity 3 Active
US9719931B2 Surface enhanced raman spectroscopy resonator structures and methods of making same Performing Operations; Transporting 2 Active
US7605063B2 Photoresist stripping chamber and methods of etching photoresist on substrates Electricity 2 Active
US9857307B2 Elevated surface enhanced Raman spectroscopy resonator structures and method of making same Physics 1 Active
US9673069B2 High frequency filter for improved RF bias signal stability Electricity 1 Active
US9318341B2 Methods for etching a substrate Performing Operations; Transporting 1 Active
US10037883B2 Enhanced productivity for an etch system through polymer management Electricity 1 Active
US8757178B2 Method and apparatus for removing photoresist Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.