Inventor · Nagaokakyo, JP

Ryuji Okamura

77Patents
15h-index
77Co-inventors
87Inventor score

Filing activity: Aug 29, 1989 → Dec 7, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US6203618A Exhaust system and vacuum processing apparatus Chemistry; Metallurgy 361 Expired
US5514217A Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof Emerging Cross-Sectional Technologies 61 Expired
US6500500B1 Method for forming a deposited film by plasma chemical vapor deposition Chemistry; Metallurgy 44 Expired
US5443645A Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure Chemistry; Metallurgy 41 Expired
US6702898B2 Deposited film forming apparatus Chemistry; Metallurgy 40 Expired
US5455138A Process for forming deposited film for light-receiving member, light-receiving member produced by the process, deposited film forming apparatus, and method for cleaning deposited film forming apparatus Physics 28 Expired
US5817181A Process for forming deposited film for light-receiving member, light-received member produced by the process deposited film forming apparatus, and method for cleaning deposited film forming apparatus Physics 25 Expired
US5030476A Process and apparatus for the formation of a functional deposited film on a cylindrical substrate by means of microwave plasma chemical vapor deposition Chemistry; Metallurgy 24 Expired
US5284730A Electrophotographic light-receiving member Physics 20 Expired
US6586149B2 Light-receiving member, image-forming apparatus, and image-forming method Physics 19 Expired
US6285566A RCC power supply with remote disabling of oscillation frequency control Electricity 17 Expired
US4954397A Light receiving member having a divided-functionally structured light receiving layer having CGL and CTL for use in electrophotography Physics 16 Expired
US5637358A Microwave plasma chemical vapor deposition process using a microwave window and movable, dielectric sheet Electricity 16 Expired
US5016565A Microwave plasma chemical vapor deposition apparatus for forming functional deposited film with means for stabilizing plasma discharge Chemistry; Metallurgy 16 Expired
US5439715A Process and apparatus for microwave plasma chemical vapor deposition Chemistry; Metallurgy 16 Expired
US5314780A Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member Emerging Cross-Sectional Technologies 15 Expired
US6135053A Apparatus for forming a deposited film by plasma chemical vapor deposition Chemistry; Metallurgy 14 Expired
US5514506A Light receiving member having a multi-layered light receiving layer with an enhanced concentration of hydrogen or/and halogen atoms in the vicinity of the interface of adjacent layers Physics 13 Expired
US5232507A Apparatus for forming deposited films with microwave plasma CVD method Electricity 12 Expired
US5433790A Deposit film forming apparatus with microwave CVD method Electricity 10 Expired
US5273851A Electrophotographic light-receiving member having surface region with high ratio of Si bonded to C Physics 9 Expired
US7033717B2 Process for producing electrophotographic photosensitive member, and electrophotographic photosensitive member and electrophotographic apparatus making use of the same Physics 8 Expired
US6078508A Self-oscillation type switching power supply apparatus Electricity 8 Expired
US6165274A Plasma processing apparatus and method Electricity 8 Expired
US5597623A Process for using microwave plasma CVD Electricity 7 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.