Sasson Somekh
86Patents
37h-index
122Co-inventors
91Inventor score
Filing activity: Aug 20, 1975 → Aug 22, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4951601A | Multi-chamber integrated process system | Emerging Cross-Sectional Technologies | 997 | Expired |
| US5855681A | Ultra high throughput wafer vacuum processing system | Electricity | 948 | Expired |
| US5186718A | Staged-vacuum wafer processing system and method | Emerging Cross-Sectional Technologies | 700 | Expired |
| US5882165A | Multiple chamber integrated process system | Electricity | 591 | Expired |
| US7482247B1 | Conformal nanolaminate dielectric deposition and etch bag gap fill process | Electricity | 530 | Active |
| US5738574A | Continuous processing system for chemical mechanical polishing | Electricity | 491 | Expired |
| US4842683A | Magnetic field-enhanced plasma etch reactor | Electricity | 303 | Expired |
| US5292393A | Multichamber integrated process system | Electricity | 286 | Expired |
| US6291334A | Etch stop layer for dual damascene process | Electricity | 257 | Expired |
| US6258170A | Vaporization and deposition apparatus | Emerging Cross-Sectional Technologies | 224 | Expired |
| US4668365A | Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition | Electricity | 175 | Expired |
| US4049944A | Process for fabricating small geometry semiconductive devices including integrated components | Electricity | 167 | Expired |
| US5849136A | High frequency semiconductor wafer processing apparatus and method | Electricity | 158 | Expired |
| US5804507A | Radially oscillating carousel processing system for chemical mechanical polishing | Performing Operations; Transporting | 157 | Expired |
| US4618262A | Laser interferometer system and method for monitoring and controlling IC processing | Physics | 150 | Expired |
| US5215619A | Magnetic field-enhanced plasma etch reactor | Electricity | 132 | Expired |
| US5897426A | Chemical mechanical polishing with multiple polishing pads | Performing Operations; Transporting | 119 | Expired |
| US6179709A | In-situ monitoring of linear substrate polishing operations | Electricity | 116 | Expired |
| US6640151B1 | Multi-tool control system, method and medium | Electricity | 112 | Expired |
| US5745331A | Electrostatic chuck with conformal insulator film | Electricity | 107 | Expired |
| US4911597A | Semiconductor processing system with robotic autoloader and load lock | Emerging Cross-Sectional Technologies | 106 | Expired |
| US5957751A | Carrier head with a substrate detection mechanism for a chemical mechanical polishing system | Performing Operations; Transporting | 101 | Expired |
| US5250467A | Method for forming low resistance and low defect density tungsten contacts to silicon semiconductor wafer | Emerging Cross-Sectional Technologies | 100 | Expired |
| US6244935A | Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet | Electricity | 95 | Expired |
| US4231811A | Variable thickness self-aligned photoresist process | Emerging Cross-Sectional Technologies | 82 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.