Scott Thompson
15Patents
9h-index
18Co-inventors
65Inventor score
Filing activity: Jul 3, 1995 → Oct 17, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6624032B2 | Structure and process flow for fabrication of dual gate floating body integrated MOS transistors | Electricity | 51 | Expired |
| US6020244A | Channel dopant implantation with automatic compensation for variations in critical dimension | Electricity | 47 | Expired |
| US6392271B1 | Structure and process flow for fabrication of dual gate floating body integrated MOS transistors | Electricity | 43 | Expired |
| US5976939A | Low damage doping technique for self-aligned source and drain regions | Electricity | 38 | Expired |
| US6228777A | Integrated circuit with borderless contacts | Electricity | 14 | Expired |
| US5877072A | Process for forming doped regions from solid phase diffusion source | Electricity | 14 | Expired |
| US6800887B1 | Nitrogen controlled growth of dislocation loop in stress enhanced transistor | Electricity | 12 | Expired |
| US7226824B2 | Nitrogen controlled growth of dislocation loop in stress enhanced transistor | Electricity | 9 | Expired |
| US7312485B2 | CMOS fabrication process utilizing special transistor orientation | Electricity | 9 | Expired |
| US6294823A | Integrated circuit with insulating spacers separating borderless contacts from the well | Electricity | 8 | Expired |
| US7187057B2 | Nitrogen controlled growth of dislocation loop in stress enhanced transistor | Electricity | 7 | Expired |
| US5874344A | Two step source/drain anneal to prevent dopant evaporation | Electricity | 6 | Expired |
| US6515351B2 | Integrated circuit with borderless contacts | Electricity | 4 | Expired |
| US7888710B2 | CMOS fabrication process utilizing special transistor orientation | Electricity | 2 | Active |
| US7723720B2 | Methods and articles incorporating local stress for performance improvement of strained semiconductor devices | Electricity | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.