Inventor · Lasów Chojnowskich, MA, US

Simon Ruffell

29Patents
4h-index
27Co-inventors
59Inventor score

Filing activity: May 11, 2012 → Sep 23, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US8846508B1 Method of implanting high aspect ratio features Electricity 17 Active
US9984889B2 Techniques for manipulating patterned features using ions Electricity 8 Active
US9589811B2 FinFET spacer etch with no fin recess and no gate-spacer pull-down Electricity 8 Active
US10008384B2 Techniques to engineer nanoscale patterned features using ions Electricity 4 Active
US11043380B2 Techniques to engineer nanoscale patterned features using ions Electricity 4 Active
US11488823B2 Techniques to engineer nanoscale patterned features using ions Electricity 2 Active
US9934981B2 Techniques for processing substrates using directional reactive ion etching Electricity 2 Active
US9287123B2 Techniques for forming angled structures for reduced defects in heteroepitaxy of semiconductor films Electricity 2 Active
US11908691B2 Techniques to engineer nanoscale patterned features using ions Electricity 1 Active
US10971368B2 Techniques for processing substrates using directional reactive ion etching Electricity 1 Active
US9453279B2 Method for selectively depositing a layer on a three dimensional structure Electricity 1 Active
US10381232B2 Techniques for manipulating patterned features using ions Electricity 1 Active
US11127593B2 Techniques and apparatus for elongation patterning using angled ion beams Electricity 1 Active
US10222202B2 Three dimensional structure fabrication control using novel processing system Physics 1 Active
US9023722B2 Compound semiconductor growth using ion implantation Electricity 1 Active
US11664193B2 Temperature controlled/electrically biased wafer surround Electricity 0 Active
US10280512B2 Apparatus and method for carbon film deposition profile control Electricity 0 Active
US10546730B2 Filling a cavity in a substrate using sputtering and deposition Electricity 0 Active
US12106943B2 Substrate halo arrangement for improved process uniformity Electricity 0 Active
US9929015B2 High efficiency apparatus and method for depositing a layer on a three dimensional structure Electricity 0 Active
US11646213B2 Multi-zone platen temperature control Electricity 0 Active
US11640909B2 Techniques and apparatus for unidirectional hole elongation using angled ion beams Electricity 0 Active
US10665421B2 In-situ beam profile metrology Electricity 0 Active
US10229832B2 Techniques for forming patterned features using directional ions Electricity 0 Active
US10109494B2 FinFet spacer etch with no fin recess and no gate-spacer pull-down Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.