Wei-Yip Loh
39Patents
5h-index
56Co-inventors
68Inventor score
Filing activity: Mar 3, 2005 → Jan 2, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8362494B2 | Electro-optic device with novel insulating structure and a method for manufacturing the same | Physics | 24 | Active |
| US7294890B2 | Fully salicided (FUSA) MOSFET structure | Electricity | 16 | Expired |
| US8436422B2 | Tunneling field-effect transistor with direct tunneling for enhanced tunneling current | Electricity | 11 | Active |
| US9029218B2 | Tunneling field-effect transistor with direct tunneling for enhanced tunneling current | Electricity | 6 | Active |
| US8421165B2 | Apparatus, system, and method for tunneling MOSFETs using self-aligned heterostructure source and isolated drain | Electricity | 5 | Active |
| US7682914B2 | Fully salicided (FUCA) MOSFET structure | Electricity | 5 | Active |
| US11348839B2 | Method of manufacturing semiconductor devices with multiple silicide regions | Electricity | 4 | Active |
| US10535748B2 | Method of forming a contact with a silicide region | Electricity | 3 | Active |
| US7439165B2 | Method of fabricating tensile strained layers and compressive strain layers for a CMOS device | Electricity | 3 | Active |
| US10504834B2 | Contact structure and the method of forming the same | Electricity | 2 | Active |
| US8178939B2 | Interfacial barrier for work function modification of high performance CMOS devices | Electricity | 2 | Active |
| US11373905B2 | Semiconductor device pre-cleaning | Electricity | 2 | Active |
| US10755917B2 | Treatment for adhesion improvement | Electricity | 2 | Active |
| US11031286B2 | Conductive feature formation and structure | Electricity | 1 | Active |
| US11232947B1 | Ammonium fluoride pre-clean protection | Electricity | 1 | Active |
| US11195791B2 | Method for forming semiconductor contact structure | Electricity | 0 | Active |
| US11335774B2 | Contact structure for semiconductor device and method | Electricity | 0 | Active |
| US11411094B2 | Contact with a silicide region | Electricity | 0 | Active |
| US12166078B2 | Contact structure for semiconductor device and method | Electricity | 0 | Active |
| US11915976B2 | Semiconductor device pre-cleaning | Electricity | 0 | Active |
| US11810826B2 | Semiconductor devices with stacked silicide regions | Electricity | 0 | Active |
| US12328890B2 | Contact with a silicide region | Electricity | 0 | Active |
| US12218012B2 | Method of manufacturing semiconductor devices with multiple silicide regions | Electricity | 0 | Active |
| US11676868B2 | Selective dual silicide formation | Electricity | 0 | Active |
| US12300542B2 | Semiconductor device pre-cleaning | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.