Yohei IKEBE
27Patents
4h-index
8Co-inventors
52Inventor score
Filing activity: Feb 20, 2014 → Dec 4, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10481484B2 | Reflective mask blank, reflective mask, method for manufacturing reflective mask blank, and method for manufacturing semiconductor device | Chemistry; Metallurgy | 9 | Active |
| US10394113B2 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Chemistry; Metallurgy | 7 | Active |
| US9864267B2 | Reflective mask blank, reflective mask, and method for manufacturing semiconductor device | Chemistry; Metallurgy | 7 | Active |
| US10871707B2 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Electricity | 5 | Active |
| US11480867B2 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Physics | 2 | Active |
| US11003068B2 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Physics | 2 | Active |
| US11531264B2 | Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method | Physics | 2 | Active |
| US11550215B2 | Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device | Physics | 1 | Active |
| US10921705B2 | Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device | Chemistry; Metallurgy | 1 | Active |
| US10067419B2 | Method for manufacturing reflective mask blank, and method for manufacturing reflective mask | Physics | 1 | Active |
| US11187972B2 | Reflective mask blank, method of manufacturing reflective mask and method of manufacturing semiconductor device | Physics | 1 | Active |
| US11281090B2 | Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device | Physics | 0 | Active |
| US11815807B2 | Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device | Physics | 0 | Active |
| US12228852B2 | Reflective mask blank, reflective mask and method for manufacturing a semiconductor device | Physics | 0 | Active |
| US11880130B2 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Physics | 0 | Active |
| US11237472B2 | Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method | Physics | 0 | Active |
| US12111566B2 | Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method | Physics | 0 | Active |
| US12411402B2 | Reflective mask blank, reflective mask, and method for manufacturing semiconductor device | Physics | 0 | Active |
| US11914281B2 | Reflective mask blank, reflective mask, and method for manufacturing semiconductor device | Physics | 0 | Active |
| US11815806B2 | Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method | Physics | 0 | Active |
| US11249385B2 | Reflective mask blank, reflective mask, method of manufacturing same, and method of manufacturing semiconductor device | Physics | 0 | Active |
| US10642149B2 | Reflective mask blank, reflective mask and method of manufacturing semiconductor device | Chemistry; Metallurgy | 0 | Active |
| US11892768B2 | Reflective mask blank, reflective mask and method of manufacturing the same, and method of manufacturing semiconductor device | Physics | 0 | Active |
| US11131921B2 | Method for manufacturing reflective mask blank, and method for manufacturing reflective mask | Physics | 0 | Active |
| US12105413B2 | Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.